Anisotropic etching of InP and InGaAs by using an inductively coupled plasma in Cl2/N2 and Cl2/Ar mixtures at low bias power

J. W. Bae, C. H. Jeong, J. T. Lim, H. C. Lee, G. Y. Yeom, I. Adesida

Research output: Contribution to journal › Article › peer-review

13 Citations (Scopus)

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Physics & Astronomy