Comparison of moving bed reactors for chemical vapor deposition coating of fine particles

Boris Golman, Kunio Shinohara

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

New co-current and counter-current types of moving-bed reactor were devised for the coating of Si3N4 ultra-fine particles in the form of agglomerates by chemical vapor deposition of AlN. An experimental parametric study has been undertaken on the effects of operational conditions on total quantity of deposited AlN inside the agglomerates. As a result, the increase in the quantity of deposit was yielded by increasing reaction temperature, inlet concentration of AlCl3 reaction gas and solids residence time, and by decreasing the agglomerate size. Comparison of counter-current and co-current arrangements of the moving bed reactor revealed that the outlet conversion of Si3N4 particles to their composite with AlN in the co-current type of reactor is slightly lower than that in the counter-current one according to the numerical simulation based on the experiments.

Original languageEnglish
Pages (from-to)65-76
Number of pages12
JournalAdvanced Powder Technology
Volume10
Issue number1
Publication statusPublished - 1999
Externally publishedYes

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Chemical vapor deposition
Deposits
Coatings
Computer simulation
Composite materials
Gases
Experiments
Temperature
silicon nitride
aluminum chloride

ASJC Scopus subject areas

  • Chemical Engineering(all)

Cite this

Comparison of moving bed reactors for chemical vapor deposition coating of fine particles. / Golman, Boris; Shinohara, Kunio.

In: Advanced Powder Technology, Vol. 10, No. 1, 1999, p. 65-76.

Research output: Contribution to journalArticle

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