DC, RF, and microwave noise performance of AlGaN-GaN field effect transistors dependence of aluminum concentration

Wu Lu, Vipan Kumar, Edwin L. Piner, Ilesanmi Adesida

Research output: Contribution to journalArticlepeer-review

68 Citations (Scopus)

Abstract

AlGaN-GaN heterostructures with different Al concentrations (20, 27, and 35%) were grown by metal-organic vapor phase epitaxy (MOVPE) on sapphire substrates. Ti-Al-Ti-Au ohmic contact optimization was investigated at different temperatures and annealing time. Heterojunction field effect transistors (HFET) with a gate length of 0.25 μm were fabricated. Low contact resistances of 0.2, 0.26, and 0.33 Ω · mm were obtained for HFET device samples with Al concentrations of 20, 27, and 35%, respectively. For Al concentration of 20, 27, and 35%, the AlGaN-GaN devices exhibited extrinsic transconductances of 143, 152, and 210 mS/mm, Idss of 398, 566, and 784 mA/mm, unity cutoff frequencies (fT) of 24.9, 34.6, and 50 GHz and maximum oscillation frequencies (fMAX) of 54.9, 61.8, and 100.9 GHz and minimum noise figures (Fmin) of 2.01, 1.47, and 1.02 dB at 12 GHz, respectively. The calculated minimum noise figures have a good agreement with the measured values for all the devices with different Al mole fractions. The noise analysis shows that intrinsic noise of these AlGaN-GaN FETs plays a prominent part in the noise behavior because of Improved device parasitics.

Original languageEnglish
Pages (from-to)1069-1074
Number of pages6
JournalIEEE Transactions on Electron Devices
Volume50
Issue number4
DOIs
Publication statusPublished - Apr 2003

Keywords

  • AlGaN
  • GaN
  • HEMTs
  • Microwave noise
  • Minimum noise figure

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Electrical and Electronic Engineering

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