Design of counter-current moving bed reactor for CVD coating of ultra-fine particles

Kunio Shinohara, Boris Golman, Kazuhiro Watanabe, Shigeo Chiba

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)

Abstract

A new counter-current type of moving bed reactor was devised for AIN coatings of Si3N4 fine particles in the form of agglomerates by chemical vapor deposition. The influence of process parameters, such as reaction time and temperature, input concentration of gas precursor, and the agglomerate size, was investigated in relation to total quantity of deposited AIN inside the agglomerates. A simplified reactor model was used to analyze the deposition data. As a result, the conversion of Si3N4 particles to their composite with AIN increased with increasing temperature and concentration of AlCl3 reaction gas and with decreasing agglomerate size. Thus, it has become possible to produce a sort of surface modified ultra-fine particle at certain coating ratios continuously.

Original languageEnglish
Pages (from-to)514-519
Number of pages6
JournalJournal of Chemical Engineering of Japan
Volume30
Issue number3
DOIs
Publication statusPublished - Jun 1997

Keywords

  • CVD
  • Coating
  • Counter Current
  • Moving Bed
  • Ultra Fine Particle

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)

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