Direct measurement of nanoscale sidewall roughness of optical waveguides using an atomic force microscope

J. H. Jang, W. Zhao, J. W. Bae, D. Selvanathan, S. L. Rommel, I. Adesida, A. Lepore, M. Kwakernaak, J. H. Abeles

Research output: Contribution to journalArticle

64 Citations (Scopus)

Abstract

The SWR of deep-etched InP/InGaAsP wveguides was directly characterized using specially designed staircase patterns that made the waveguide's sidewalls accessible for large area scanning with AFM tips. Thus, ICP-RIE using NiCr/SiO2 composite masking layer resulted in very smooth and highly vertical sidewall profiles. Autocovariance function and power spectrum of SWR were used to estimate optical loss performance of waveguides.

Original languageEnglish
Pages (from-to)4116-4118
Number of pages3
JournalApplied Physics Letters
Volume83
Issue number20
DOIs
Publication statusPublished - Nov 17 2003

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Fingerprint Dive into the research topics of 'Direct measurement of nanoscale sidewall roughness of optical waveguides using an atomic force microscope'. Together they form a unique fingerprint.

  • Cite this

    Jang, J. H., Zhao, W., Bae, J. W., Selvanathan, D., Rommel, S. L., Adesida, I., Lepore, A., Kwakernaak, M., & Abeles, J. H. (2003). Direct measurement of nanoscale sidewall roughness of optical waveguides using an atomic force microscope. Applied Physics Letters, 83(20), 4116-4118. https://doi.org/10.1063/1.1627480