Direct measurement of nanoscale sidewall roughness of optical waveguides using an atomic force microscope

J. H. Jang, W. Zhao, J. W. Bae, D. Selvanathan, S. L. Rommel, I. Adesida, A. Lepore, M. Kwakernaak, J. H. Abeles

Research output: Contribution to journalArticle

61 Citations (Scopus)

Abstract

The SWR of deep-etched InP/InGaAsP wveguides was directly characterized using specially designed staircase patterns that made the waveguide's sidewalls accessible for large area scanning with AFM tips. Thus, ICP-RIE using NiCr/SiO2 composite masking layer resulted in very smooth and highly vertical sidewall profiles. Autocovariance function and power spectrum of SWR were used to estimate optical loss performance of waveguides.

Original languageEnglish
Pages (from-to)4116-4118
Number of pages3
JournalApplied Physics Letters
Volume83
Issue number20
DOIs
Publication statusPublished - Nov 17 2003
Externally publishedYes

Fingerprint

optical waveguides
roughness
microscopes
waveguides
stairways
masking
power spectra
atomic force microscopy
scanning
composite materials
estimates
profiles

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Jang, J. H., Zhao, W., Bae, J. W., Selvanathan, D., Rommel, S. L., Adesida, I., ... Abeles, J. H. (2003). Direct measurement of nanoscale sidewall roughness of optical waveguides using an atomic force microscope. Applied Physics Letters, 83(20), 4116-4118. https://doi.org/10.1063/1.1627480

Direct measurement of nanoscale sidewall roughness of optical waveguides using an atomic force microscope. / Jang, J. H.; Zhao, W.; Bae, J. W.; Selvanathan, D.; Rommel, S. L.; Adesida, I.; Lepore, A.; Kwakernaak, M.; Abeles, J. H.

In: Applied Physics Letters, Vol. 83, No. 20, 17.11.2003, p. 4116-4118.

Research output: Contribution to journalArticle

Jang, JH, Zhao, W, Bae, JW, Selvanathan, D, Rommel, SL, Adesida, I, Lepore, A, Kwakernaak, M & Abeles, JH 2003, 'Direct measurement of nanoscale sidewall roughness of optical waveguides using an atomic force microscope', Applied Physics Letters, vol. 83, no. 20, pp. 4116-4118. https://doi.org/10.1063/1.1627480
Jang, J. H. ; Zhao, W. ; Bae, J. W. ; Selvanathan, D. ; Rommel, S. L. ; Adesida, I. ; Lepore, A. ; Kwakernaak, M. ; Abeles, J. H. / Direct measurement of nanoscale sidewall roughness of optical waveguides using an atomic force microscope. In: Applied Physics Letters. 2003 ; Vol. 83, No. 20. pp. 4116-4118.
@article{eadaf273748a4b95b22b42663a5d9b40,
title = "Direct measurement of nanoscale sidewall roughness of optical waveguides using an atomic force microscope",
abstract = "The SWR of deep-etched InP/InGaAsP wveguides was directly characterized using specially designed staircase patterns that made the waveguide's sidewalls accessible for large area scanning with AFM tips. Thus, ICP-RIE using NiCr/SiO2 composite masking layer resulted in very smooth and highly vertical sidewall profiles. Autocovariance function and power spectrum of SWR were used to estimate optical loss performance of waveguides.",
author = "Jang, {J. H.} and W. Zhao and Bae, {J. W.} and D. Selvanathan and Rommel, {S. L.} and I. Adesida and A. Lepore and M. Kwakernaak and Abeles, {J. H.}",
year = "2003",
month = "11",
day = "17",
doi = "10.1063/1.1627480",
language = "English",
volume = "83",
pages = "4116--4118",
journal = "Applied Physics Letters",
issn = "0003-6951",
publisher = "American Institute of Physics Publising LLC",
number = "20",

}

TY - JOUR

T1 - Direct measurement of nanoscale sidewall roughness of optical waveguides using an atomic force microscope

AU - Jang, J. H.

AU - Zhao, W.

AU - Bae, J. W.

AU - Selvanathan, D.

AU - Rommel, S. L.

AU - Adesida, I.

AU - Lepore, A.

AU - Kwakernaak, M.

AU - Abeles, J. H.

PY - 2003/11/17

Y1 - 2003/11/17

N2 - The SWR of deep-etched InP/InGaAsP wveguides was directly characterized using specially designed staircase patterns that made the waveguide's sidewalls accessible for large area scanning with AFM tips. Thus, ICP-RIE using NiCr/SiO2 composite masking layer resulted in very smooth and highly vertical sidewall profiles. Autocovariance function and power spectrum of SWR were used to estimate optical loss performance of waveguides.

AB - The SWR of deep-etched InP/InGaAsP wveguides was directly characterized using specially designed staircase patterns that made the waveguide's sidewalls accessible for large area scanning with AFM tips. Thus, ICP-RIE using NiCr/SiO2 composite masking layer resulted in very smooth and highly vertical sidewall profiles. Autocovariance function and power spectrum of SWR were used to estimate optical loss performance of waveguides.

UR - http://www.scopus.com/inward/record.url?scp=0347410958&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0347410958&partnerID=8YFLogxK

U2 - 10.1063/1.1627480

DO - 10.1063/1.1627480

M3 - Article

AN - SCOPUS:0347410958

VL - 83

SP - 4116

EP - 4118

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 20

ER -