In the past few year, the possibility of electron beam microfabrication on the nanometer scale has attracted interest. For our initial measurements, we have fabricated grooved and slotted structures. They consist of arrays 160 A wide multiplied by 600 A high multiplied by 5000 A long PMMA ridges on top of a 500 A thick single-crystal silicon substrate. Arrays in other materials are also being fabricated. Both the PMMA and Si substrate are thinner than one mean free path for inelastic scattering (of 100keV electrons). The walls of the PMMA are nearly vertical (a limitation at present).
|Number of pages
|Proceedings, Annual Conference - Microbeam Analysis Society
|Published - Dec 1 1984
ASJC Scopus subject areas
- General Engineering