Various drying etching techniques are briefly reviewed and application of some of these techniques for the fabrication of small structures in electronic and metallic materials are discussed. Experimental results from reactive ion etching, reactive ion beam etching, and chemically assisted ion beam etching will be shown for a number of substrate/etch mask systems at dimensions well below 1 fim linewidths.
|Number of pages||6|
|Journal||Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films|
|Publication status||Published - Apr 1984|
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films