Dry Etching for Submicron Structures

E. D. Wolf, I. Adesida, J. D. Chinn

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Various drying etching techniques are briefly reviewed and application of some of these techniques for the fabrication of small structures in electronic and metallic materials are discussed. Experimental results from reactive ion etching, reactive ion beam etching, and chemically assisted ion beam etching will be shown for a number of substrate/etch mask systems at dimensions well below 1 fim linewidths.

Original languageEnglish
Pages (from-to)464-469
Number of pages6
JournalJournal of Vacuum Science and Technology A
Volume2
Issue number2
DOIs
Publication statusPublished - 1984
Externally publishedYes

Fingerprint

Dry etching
Etching
etching
Ion beams
ion beams
Reactive ion etching
Linewidth
Masks
Drying
drying
Fabrication
masks
Substrates
fabrication
electronics
ions

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Dry Etching for Submicron Structures. / Wolf, E. D.; Adesida, I.; Chinn, J. D.

In: Journal of Vacuum Science and Technology A, Vol. 2, No. 2, 1984, p. 464-469.

Research output: Contribution to journalArticle

Wolf, E. D. ; Adesida, I. ; Chinn, J. D. / Dry Etching for Submicron Structures. In: Journal of Vacuum Science and Technology A. 1984 ; Vol. 2, No. 2. pp. 464-469.
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