Effect of H2 on the etch profile of InP/InGaAsP alloys in Cl2/Ar/H2 inductively coupled plasma reactive ion etching chemistries for photonic device fabrication

  • Sean L. Rommel
  • , Jae Hyung Jang
  • , Wu Lu
  • , Gabriel Cueva
  • , Ling Zhou
  • , Ilesanmi Adesida
  • , Gary Pajer
  • , Ralph Whaley
  • , Allen Lepore
  • , Zane Schellanbarger
  • , Joseph H. Abeles

Research output: Contribution to journal › Conference article › peer-review

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