FABRICATION OF APERTURES, SLOTS, AND GROOVES AT THE 8-80 nm SCALE IN SILICON AND METAL FILMS.

A. Muray, M. Isaacson, I. Adesida, B. Whitehead

Research output: Contribution to journalConference articlepeer-review

16 Citations (Scopus)

Abstract

Fabrication of apertures, slots, and grooves in silicon, gold-palladium, and lithium fluoride has been demonstrated using a 100 kev electron beam. For the LiF films the authors have been able to etch less than 2 nm wide by 50 nm deep grooves on 10 nm centers. Grooves in silicon 8 nm wide by 30 nm deep have been made by reactive ion etching in SF//6. Apertures as small as 8 nm in diameter have been produced in AuPd films self-supported over larger holes in 60 nm thick Si windows.

Original languageEnglish
Pages (from-to)1091-1095
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume1
Issue number4
DOIs
Publication statusPublished - Jan 1 1983
EventProc of the Int Symp on Electron, Ion, and Photon Beams - Los Angeles, CA, USA
Duration: May 31 1983Jun 3 1983

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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