Fabrication of InP-based wavelength division multiplexing arrayed wavequide filters using chemically assisted ion beam etching

C. Youtsey, I. Adesida, J. B D Soole, M. R. Amersfoort, H. P. LeBlanc, N. C. Andreadakis, A. Rajhel, C. Caneau, M. A. Koza, R. Bhat

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Chemically assisted ion beam etching using Cl2 has been used to fabricate InP-based arrayed waveguide filters that demonstrate full polarization independence and excellent performance characteristics. The process is carried out at elevated temperatures of approximately 250 °C to avoid difficulties associated with the low volatility of indium chlorides at lower temperatures. Optimization of the process for smooth, vertical etching is discussed. InP regrowth is successfully carried out on the etched. InGaAsP guides, and measurements of the fabricated devices are presented. The adaptation of the process for angled etching is also demonstrated.

Original languageEnglish
Pages (from-to)4091-4095
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume14
Issue number6
Publication statusPublished - Nov 1996
Externally publishedYes

Fingerprint

wavelength division multiplexing
Wavelength division multiplexing
Ion beams
Etching
ion beams
etching
filters
Fabrication
fabrication
waveguide filters
Waveguide filters
volatility
Indium
indium
chlorides
Polarization
Temperature
optimization
polarization
temperature

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Physics and Astronomy (miscellaneous)
  • Surfaces and Interfaces

Cite this

Fabrication of InP-based wavelength division multiplexing arrayed wavequide filters using chemically assisted ion beam etching. / Youtsey, C.; Adesida, I.; Soole, J. B D; Amersfoort, M. R.; LeBlanc, H. P.; Andreadakis, N. C.; Rajhel, A.; Caneau, C.; Koza, M. A.; Bhat, R.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 14, No. 6, 11.1996, p. 4091-4095.

Research output: Contribution to journalArticle

Youtsey, C, Adesida, I, Soole, JBD, Amersfoort, MR, LeBlanc, HP, Andreadakis, NC, Rajhel, A, Caneau, C, Koza, MA & Bhat, R 1996, 'Fabrication of InP-based wavelength division multiplexing arrayed wavequide filters using chemically assisted ion beam etching', Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, vol. 14, no. 6, pp. 4091-4095.
Youtsey, C. ; Adesida, I. ; Soole, J. B D ; Amersfoort, M. R. ; LeBlanc, H. P. ; Andreadakis, N. C. ; Rajhel, A. ; Caneau, C. ; Koza, M. A. ; Bhat, R. / Fabrication of InP-based wavelength division multiplexing arrayed wavequide filters using chemically assisted ion beam etching. In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 1996 ; Vol. 14, No. 6. pp. 4091-4095.
@article{664a46c4ff214a61974a969473ef0c74,
title = "Fabrication of InP-based wavelength division multiplexing arrayed wavequide filters using chemically assisted ion beam etching",
abstract = "Chemically assisted ion beam etching using Cl2 has been used to fabricate InP-based arrayed waveguide filters that demonstrate full polarization independence and excellent performance characteristics. The process is carried out at elevated temperatures of approximately 250 °C to avoid difficulties associated with the low volatility of indium chlorides at lower temperatures. Optimization of the process for smooth, vertical etching is discussed. InP regrowth is successfully carried out on the etched. InGaAsP guides, and measurements of the fabricated devices are presented. The adaptation of the process for angled etching is also demonstrated.",
author = "C. Youtsey and I. Adesida and Soole, {J. B D} and Amersfoort, {M. R.} and LeBlanc, {H. P.} and Andreadakis, {N. C.} and A. Rajhel and C. Caneau and Koza, {M. A.} and R. Bhat",
year = "1996",
month = "11",
language = "English",
volume = "14",
pages = "4091--4095",
journal = "Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena",
issn = "1071-1023",
publisher = "AVS Science and Technology Society",
number = "6",

}

TY - JOUR

T1 - Fabrication of InP-based wavelength division multiplexing arrayed wavequide filters using chemically assisted ion beam etching

AU - Youtsey, C.

AU - Adesida, I.

AU - Soole, J. B D

AU - Amersfoort, M. R.

AU - LeBlanc, H. P.

AU - Andreadakis, N. C.

AU - Rajhel, A.

AU - Caneau, C.

AU - Koza, M. A.

AU - Bhat, R.

PY - 1996/11

Y1 - 1996/11

N2 - Chemically assisted ion beam etching using Cl2 has been used to fabricate InP-based arrayed waveguide filters that demonstrate full polarization independence and excellent performance characteristics. The process is carried out at elevated temperatures of approximately 250 °C to avoid difficulties associated with the low volatility of indium chlorides at lower temperatures. Optimization of the process for smooth, vertical etching is discussed. InP regrowth is successfully carried out on the etched. InGaAsP guides, and measurements of the fabricated devices are presented. The adaptation of the process for angled etching is also demonstrated.

AB - Chemically assisted ion beam etching using Cl2 has been used to fabricate InP-based arrayed waveguide filters that demonstrate full polarization independence and excellent performance characteristics. The process is carried out at elevated temperatures of approximately 250 °C to avoid difficulties associated with the low volatility of indium chlorides at lower temperatures. Optimization of the process for smooth, vertical etching is discussed. InP regrowth is successfully carried out on the etched. InGaAsP guides, and measurements of the fabricated devices are presented. The adaptation of the process for angled etching is also demonstrated.

UR - http://www.scopus.com/inward/record.url?scp=0343259299&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0343259299&partnerID=8YFLogxK

M3 - Article

VL - 14

SP - 4091

EP - 4095

JO - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena

JF - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena

SN - 1071-1023

IS - 6

ER -