Fabrication of triangular nanochannels using the collapse of hydrogen silsesquioxane resists

Sookyung Choi, Minjun Yan, Ilesanmi Adesida

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

We report a simple method to fabricate nanometer-scale channels using hydrogen silsesquioxane (HSQ) resists. The collapse of high-aspect-ratio structures during the rinse and drying steps results in self-formed enclosed triangular-shaped channels. Using electron-beam lithography, dense arrays of HSQ triangular nanochannels were fabricated with high precision. This approach provides significant flexibility in design and simplicity in processing. We also show that the properties of HSQ resists are well suited for the fabrication of buried nanochannel structures.

Original languageEnglish
Article number163113
JournalApplied Physics Letters
Volume93
Issue number16
DOIs
Publication statusPublished - 2008
Externally publishedYes

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fabrication
hydrogen
high aspect ratio
drying
flexibility
lithography
electron beams

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Fabrication of triangular nanochannels using the collapse of hydrogen silsesquioxane resists. / Choi, Sookyung; Yan, Minjun; Adesida, Ilesanmi.

In: Applied Physics Letters, Vol. 93, No. 16, 163113, 2008.

Research output: Contribution to journalArticle

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