HIGH RESOLUTION ELECTRON-BEAM LITHOGRAPHY ON THIN FILMS.

I. Adesida, T. E. Everhart, R. Shimizu

Research output: Contribution to journalArticle

25 Citations (Scopus)

Abstract

The influence of electron scattering on the resolution of electron-beam lithography has been studied. Two different Monte-Carlo approaches were used to study the spatial extent of energy dissipation in a thin film of electron sensitive polymer film coated on various thicknesses of silicon substrates. It is shown that higher resolution in electron beam lithography can be achieved by using thin electron sensitive resist layers and thin substrates. Improvement of proximity effect is also obtained for thin structures.

Original languageEnglish
Pages (from-to)1743-1748
Number of pages6
JournalJ VAC SCI TECHNOL
Volume16
Issue number6
DOIs
Publication statusPublished - Nov 1979
Externally publishedYes

Fingerprint

Electron beam lithography
Thin films
Electron scattering
Electrons
Substrates
Polymer films
Energy dissipation
Silicon

ASJC Scopus subject areas

  • Engineering(all)

Cite this

HIGH RESOLUTION ELECTRON-BEAM LITHOGRAPHY ON THIN FILMS. / Adesida, I.; Everhart, T. E.; Shimizu, R.

In: J VAC SCI TECHNOL, Vol. 16, No. 6, 11.1979, p. 1743-1748.

Research output: Contribution to journalArticle

Adesida, I. ; Everhart, T. E. ; Shimizu, R. / HIGH RESOLUTION ELECTRON-BEAM LITHOGRAPHY ON THIN FILMS. In: J VAC SCI TECHNOL. 1979 ; Vol. 16, No. 6. pp. 1743-1748.
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