Abstract
The design, fabrication, and performance of a long-wavelength high-speed monolithically integrated photoreceiver suitable for receiving 12 Gb/s data is reported. The photoreceiver has been fabricated in a single growth run using lattice-matched materials on a planar InP substrate by organometallic vapor phase epitaxy (OMVPE). The circuit design employs a three-stage transimpedance preamplifier topology based on high electron mobility transistors (HEMTs) and a top-illuminated pin photodiode. The completed photoreceiver demonstrated an optoelectronic -3 dB bandwidth of 8.3 GHz, with an average input-referred noise current spectral density of 8.8 pA/Hz 1/2 . Bit error rate measurements of packaged photoreceivers showed a sensitivity (at a bit error ratio of 10-9) of -17.7 dBm at 10 Gb/s and -15.8 dBm at 12 Gb/s, for a 231-1 pattern-length pseudorandom bit stream at a wavelength of 1.55 μm. To the author's knowledge, this is the best directly-measured sensitivity for a HEMT-based integrated photoreceiver at these bit rates.
Original language | English |
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Pages (from-to) | 439-442 |
Number of pages | 4 |
Journal | Conference Proceedings - International Conference on Indium Phosphide and Related Materials |
Publication status | Published - Dec 1 1998 |
Event | Proceedings of the 1998 International Conference on Indium Phosphide and Related Materials - Tsukuba, Jpn Duration: May 11 1998 → May 15 1998 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Electrical and Electronic Engineering