Influence of technological conditions on optical and structural properties of molybdenum oxide thin films

Taras T. Kovaliuk, Mykhailo M. Solovan, Orest A. Parfenyuk, Viktor V. Brus, Ivan P. Koziarskyi, Pavlo D. Maryanchuk

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Citations (Scopus)

Abstract

MoOx thin films were deposited are deposited by DC reactive magnetron sputtering at different technological conditions. Structural, electrical and optical properties of the thin films were investigated. Temperature dependences of the resistance R of the MoOx films were measured within the temperature range T /295-420 K. There was established that all samples under investigation had n-type of conductivity. Based on the dependences a2 = f(h), the presence of direct allowed interband optical transitions in the MoOx thin films is established and the optical band gap values are determined.

Original languageEnglish
Title of host publicationThirteenth International Conference on Correlation Optics
EditorsOleg V. Angelsky
PublisherSPIE
ISBN (Electronic)9781510617278
DOIs
Publication statusPublished - 2018
Externally publishedYes
Event13th International Conference on Correlation Optics - Chernivtsi, Ukraine
Duration: Sep 11 2017Sep 15 2017

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume10612
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

Conference13th International Conference on Correlation Optics
CountryUkraine
CityChernivtsi
Period9/11/179/15/17

Keywords

  • MoOx
  • Optical properties
  • Reactive magnetron sputtering
  • Thin films

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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