Investigation of surface roughness of poly(methylmethacrylate) developed at reduced temperatures

M. Yan, S. Choi, J. Lee, K. R.V. Subramanian, I. Adesida

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

The surface roughness of poly(methylmethacrylate) (PMMA) with various molecular weights, using 50 keV electron beam, has been investigated at reduced developer temperatures. As the developer temperature decreased, the magnitude of the surface roughness increased rapidly while the contrast curves merged into a single curve below 0 °C. A sharp drop in roughness at the bottom of the resist was observed for all temperatures investigated. At each temperature, the higher molecular weight PMMA had higher maximum roughness.

Original languageEnglish
Pages (from-to)3010-3013
Number of pages4
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume27
Issue number6
DOIs
Publication statusPublished - Dec 1 2009

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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