Nano-pattern formation via grafted polymers in poor solvents

S. K. Pattanayek; T. T. Pham; G. G. Pereira

doi:10.1016/j.cap.2005.11.063

Nano-pattern formation via grafted polymers in poor solvents

S. K. Pattanayek, T. T. Pham, G. G. Pereira

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

Patterned substrates and films are important in a variety of applications from microelectronics, bimemetic material fabrications and smart or switchable surfaces. Here we investigate the morphological structures that can form from a grafted polymer system immersed in a poor solvent. Novel morphological structures such as hexagonally ordered fused micelles, elongated cylindrical micelles and inverted solvent filled micelles are formed.

Original language	English
Pages (from-to)	571-574
Number of pages	4
Journal	Current Applied Physics
Volume	6
Issue number	3
DOIs	https://doi.org/10.1016/j.cap.2005.11.063
Publication status	Published - Jun 2006
Externally published	Yes

Keywords

Nanoscale
Polymers
Self-assembly

ASJC Scopus subject areas

General Materials Science
General Physics and Astronomy

Access to Document

10.1016/j.cap.2005.11.063

Cite this

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title = "Nano-pattern formation via grafted polymers in poor solvents",

abstract = "Patterned substrates and films are important in a variety of applications from microelectronics, bimemetic material fabrications and smart or switchable surfaces. Here we investigate the morphological structures that can form from a grafted polymer system immersed in a poor solvent. Novel morphological structures such as hexagonally ordered fused micelles, elongated cylindrical micelles and inverted solvent filled micelles are formed.",

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author = "Pattanayek, {S. K.} and Pham, {T. T.} and Pereira, {G. G.}",

year = "2006",

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AU - Pattanayek, S. K.

AU - Pham, T. T.

AU - Pereira, G. G.

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N2 - Patterned substrates and films are important in a variety of applications from microelectronics, bimemetic material fabrications and smart or switchable surfaces. Here we investigate the morphological structures that can form from a grafted polymer system immersed in a poor solvent. Novel morphological structures such as hexagonally ordered fused micelles, elongated cylindrical micelles and inverted solvent filled micelles are formed.

AB - Patterned substrates and films are important in a variety of applications from microelectronics, bimemetic material fabrications and smart or switchable surfaces. Here we investigate the morphological structures that can form from a grafted polymer system immersed in a poor solvent. Novel morphological structures such as hexagonally ordered fused micelles, elongated cylindrical micelles and inverted solvent filled micelles are formed.

KW - Nanoscale

KW - Polymers

KW - Self-assembly

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ER -

Nano-pattern formation via grafted polymers in poor solvents

Abstract

Keywords

ASJC Scopus subject areas

Access to Document

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