This paper describes the fundamental principles and experimental status of gas cluster ion beam (GCIB) processing as a new technique with promise for practical industrial applications. A review is presented of the theoretical and experimental characteristics of new gas cluster ion bombardment processes and of related equipment development. The impacts of accelerated cluster ions upon substrate surfaces impart very high-energy densities in the impact regions of individual clusters and produce non-linear processes that are not present in the impacts of individual atomic ions. These unique bombardment characteristics are expected to facilitate new industrial applications that would not be possible by traditional ion beam processing. Among these are shallow ion implantation, high rate sputtering, surface cleaning and smoothing, and low-temperature thin film formation.
|Number of pages||16|
|Journal||Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms|
|Publication status||Published - Apr 2000|
|Event||ICACS-18: 18th International Conference on Atomic Collisions in Solids - Odense, Denmark|
Duration: Aug 3 1999 → Aug 8 1999
ASJC Scopus subject areas
- Nuclear and High Energy Physics