Nano-processing with gas cluster ion beams

Isao Yamada, Jiro Matsuo, Zinetulla Insepov, Takaaki Aoki, Toshio Seki, Noriaki Toyoda

Research output: Contribution to journalConference articlepeer-review

93 Citations (Scopus)


This paper describes the fundamental principles and experimental status of gas cluster ion beam (GCIB) processing as a new technique with promise for practical industrial applications. A review is presented of the theoretical and experimental characteristics of new gas cluster ion bombardment processes and of related equipment development. The impacts of accelerated cluster ions upon substrate surfaces impart very high-energy densities in the impact regions of individual clusters and produce non-linear processes that are not present in the impacts of individual atomic ions. These unique bombardment characteristics are expected to facilitate new industrial applications that would not be possible by traditional ion beam processing. Among these are shallow ion implantation, high rate sputtering, surface cleaning and smoothing, and low-temperature thin film formation.

Original languageEnglish
Pages (from-to)944-959
Number of pages16
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Publication statusPublished - Apr 2000
EventICACS-18: 18th International Conference on Atomic Collisions in Solids - Odense, Denmark
Duration: Aug 3 1999Aug 8 1999

ASJC Scopus subject areas

  • Nuclear and High Energy Physics
  • Instrumentation


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