Abstract
This paper describes the fundamental principles and experimental status of gas cluster ion beam (GCIB) processing as a new technique with promise for practical industrial applications. A review is presented of the theoretical and experimental characteristics of new gas cluster ion bombardment processes and of related equipment development. The impacts of accelerated cluster ions upon substrate surfaces impart very high-energy densities in the impact regions of individual clusters and produce non-linear processes that are not present in the impacts of individual atomic ions. These unique bombardment characteristics are expected to facilitate new industrial applications that would not be possible by traditional ion beam processing. Among these are shallow ion implantation, high rate sputtering, surface cleaning and smoothing, and low-temperature thin film formation.
| Original language | English |
|---|---|
| Pages (from-to) | 944-959 |
| Number of pages | 16 |
| Journal | Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms |
| Volume | 164 |
| DOIs | |
| Publication status | Published - Apr 2000 |
| Externally published | Yes |
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ASJC Scopus subject areas
- Surfaces, Coatings and Films
- Instrumentation
- Surfaces and Interfaces
Cite this
Nano-processing with gas cluster ion beams. / Yamada, Isao; Matsuo, Jiro; Insepov, Zinetulla; Aoki, Takaaki; Seki, Toshio; Toyoda, Noriaki.
In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Vol. 164, 04.2000, p. 944-959.Research output: Contribution to journal › Article
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TY - JOUR
T1 - Nano-processing with gas cluster ion beams
AU - Yamada, Isao
AU - Matsuo, Jiro
AU - Insepov, Zinetulla
AU - Aoki, Takaaki
AU - Seki, Toshio
AU - Toyoda, Noriaki
PY - 2000/4
Y1 - 2000/4
N2 - This paper describes the fundamental principles and experimental status of gas cluster ion beam (GCIB) processing as a new technique with promise for practical industrial applications. A review is presented of the theoretical and experimental characteristics of new gas cluster ion bombardment processes and of related equipment development. The impacts of accelerated cluster ions upon substrate surfaces impart very high-energy densities in the impact regions of individual clusters and produce non-linear processes that are not present in the impacts of individual atomic ions. These unique bombardment characteristics are expected to facilitate new industrial applications that would not be possible by traditional ion beam processing. Among these are shallow ion implantation, high rate sputtering, surface cleaning and smoothing, and low-temperature thin film formation.
AB - This paper describes the fundamental principles and experimental status of gas cluster ion beam (GCIB) processing as a new technique with promise for practical industrial applications. A review is presented of the theoretical and experimental characteristics of new gas cluster ion bombardment processes and of related equipment development. The impacts of accelerated cluster ions upon substrate surfaces impart very high-energy densities in the impact regions of individual clusters and produce non-linear processes that are not present in the impacts of individual atomic ions. These unique bombardment characteristics are expected to facilitate new industrial applications that would not be possible by traditional ion beam processing. Among these are shallow ion implantation, high rate sputtering, surface cleaning and smoothing, and low-temperature thin film formation.
UR - http://www.scopus.com/inward/record.url?scp=0033733855&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0033733855&partnerID=8YFLogxK
U2 - 10.1016/S0168-583X(99)01163-5
DO - 10.1016/S0168-583X(99)01163-5
M3 - Article
VL - 164
SP - 944
EP - 959
JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
SN - 0168-583X
ER -