Nanometer structure fabrication using electron beam lithography

M. Isaacson, A. Muray, M. Scheinfein, I. Adesida, E. Kratschmer

Research output: Contribution to journalArticlepeer-review

9 Citations (Scopus)


We review the program at Cornell University aimed at investigation of the size limits of patterning material using high energy electron beams. Structures at the 1-10 nanometer size scale have been fabricated using subnanometer diameter 100 keV electron beams. Using electron beam defined masks, we demonstrate ion beam replication of structures less than 30nm in width. Finally, in situ fabrication of metal structures with walls vertical to 0.8nm is shown using electron beam modification of AlF3.

Original languageEnglish
Pages (from-to)58-64
Number of pages7
JournalMicroelectronic Engineering
Issue number1-3
Publication statusPublished - Oct 1984

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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