TY - JOUR
T1 - New phenalenone derivatives
T2 - Synthesis and evaluation of their singlet oxygen quantum yield
AU - Godard, Jérémy
AU - Brégier, Frédérique
AU - Arnoux, Philippe
AU - Myrzakhmetov, Bauyrzhan
AU - Champavier, Yves
AU - Frochot, Céline
AU - Sol, Vincent
N1 - Publisher Copyright:
©
PY - 2020/11/3
Y1 - 2020/11/3
N2 - 1H-Phenalen-1-one is a very efficient and easy-to-synthesize photosensitizer. Many substitutions have been previously described, but most of them significantly reduce the singlet oxygen quantum yield. The chloromethyl derivative described elsewhere is a good starting point for the synthesis of many useful derivatives because of the methylene bridge that saves its unique photosensitizing properties. Eighteen new phenalenone derivatives have been synthesized, bearing amine, carboxylic acid, alcohol, azide, and other major functional groups in organic chemistry. These reactions were carried out in good-to-excellent yields, and most of these new compounds retained the singlet oxygen quantum yield of the parent molecule. These new derivatives are very promising precursors for a number of applications such as the development of photosensitive antimicrobial agents or materials.
AB - 1H-Phenalen-1-one is a very efficient and easy-to-synthesize photosensitizer. Many substitutions have been previously described, but most of them significantly reduce the singlet oxygen quantum yield. The chloromethyl derivative described elsewhere is a good starting point for the synthesis of many useful derivatives because of the methylene bridge that saves its unique photosensitizing properties. Eighteen new phenalenone derivatives have been synthesized, bearing amine, carboxylic acid, alcohol, azide, and other major functional groups in organic chemistry. These reactions were carried out in good-to-excellent yields, and most of these new compounds retained the singlet oxygen quantum yield of the parent molecule. These new derivatives are very promising precursors for a number of applications such as the development of photosensitive antimicrobial agents or materials.
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U2 - 10.1021/acsomega.0c04172
DO - 10.1021/acsomega.0c04172
M3 - Article
AN - SCOPUS:85096017952
SN - 2470-1343
VL - 5
SP - 28264
EP - 28272
JO - ACS Omega
JF - ACS Omega
IS - 43
ER -