Non-linear processes in the gas cluster ion beam modification of solid surfaces

I. Yamada, J. Matsuo, N. Toyoda, T. Aoki, E. Jones, Z. Insepov

Research output: Contribution to journalArticlepeer-review

66 Citations (Scopus)

Abstract

The unique characteristics of gas cluster ion beam processing are reviewed. Cluster ion beams consisting of hundreds to thousands of atoms have been generated from various kinds of gas materials. Multiple collisions during the impact of accelerated cluster ions upon the substrate surfaces produce fundamentally non-linear bombarding processes. These bombarding characteristics can be applied to shallow ion implantation, high yield sputtering and smoothing, surface cleaning and low temperature thin film formation.

Original languageEnglish
Pages (from-to)249-257
Number of pages9
JournalMaterials Science and Engineering A
Volume253
Issue number1-2
DOIs
Publication statusPublished - Sep 30 1998
Externally publishedYes

Keywords

  • Cluster ion beam
  • Cluster ion-assisted thin film deposition
  • Shallow ion implantation
  • Sputtering
  • Surface smoothing

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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