Non-linear processes in the gas cluster ion beam modification of solid surfaces

I. Yamada, J. Matsuo, N. Toyoda, T. Aoki, E. Jones, Z. Insepov

Research output: Contribution to journalArticle

64 Citations (Scopus)

Abstract

The unique characteristics of gas cluster ion beam processing are reviewed. Cluster ion beams consisting of hundreds to thousands of atoms have been generated from various kinds of gas materials. Multiple collisions during the impact of accelerated cluster ions upon the substrate surfaces produce fundamentally non-linear bombarding processes. These bombarding characteristics can be applied to shallow ion implantation, high yield sputtering and smoothing, surface cleaning and low temperature thin film formation.

Original languageEnglish
Pages (from-to)249-257
Number of pages9
JournalMaterials Science and Engineering A
Volume253
Issue number1-2
Publication statusPublished - Sep 30 1998
Externally publishedYes

Fingerprint

solid surfaces
Ion beams
Gases
ion beams
Surface cleaning
gases
Ion implantation
Sputtering
Ions
smoothing
Thin films
Atoms
cleaning
ion implantation
Substrates
Processing
sputtering
collisions
thin films
Temperature

Keywords

  • Cluster ion beam
  • Cluster ion-assisted thin film deposition
  • Shallow ion implantation
  • Sputtering
  • Surface smoothing

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Yamada, I., Matsuo, J., Toyoda, N., Aoki, T., Jones, E., & Insepov, Z. (1998). Non-linear processes in the gas cluster ion beam modification of solid surfaces. Materials Science and Engineering A, 253(1-2), 249-257.

Non-linear processes in the gas cluster ion beam modification of solid surfaces. / Yamada, I.; Matsuo, J.; Toyoda, N.; Aoki, T.; Jones, E.; Insepov, Z.

In: Materials Science and Engineering A, Vol. 253, No. 1-2, 30.09.1998, p. 249-257.

Research output: Contribution to journalArticle

Yamada, I, Matsuo, J, Toyoda, N, Aoki, T, Jones, E & Insepov, Z 1998, 'Non-linear processes in the gas cluster ion beam modification of solid surfaces', Materials Science and Engineering A, vol. 253, no. 1-2, pp. 249-257.
Yamada, I. ; Matsuo, J. ; Toyoda, N. ; Aoki, T. ; Jones, E. ; Insepov, Z. / Non-linear processes in the gas cluster ion beam modification of solid surfaces. In: Materials Science and Engineering A. 1998 ; Vol. 253, No. 1-2. pp. 249-257.
@article{237a833430c940438a65ee4c7688b84e,
title = "Non-linear processes in the gas cluster ion beam modification of solid surfaces",
abstract = "The unique characteristics of gas cluster ion beam processing are reviewed. Cluster ion beams consisting of hundreds to thousands of atoms have been generated from various kinds of gas materials. Multiple collisions during the impact of accelerated cluster ions upon the substrate surfaces produce fundamentally non-linear bombarding processes. These bombarding characteristics can be applied to shallow ion implantation, high yield sputtering and smoothing, surface cleaning and low temperature thin film formation.",
keywords = "Cluster ion beam, Cluster ion-assisted thin film deposition, Shallow ion implantation, Sputtering, Surface smoothing",
author = "I. Yamada and J. Matsuo and N. Toyoda and T. Aoki and E. Jones and Z. Insepov",
year = "1998",
month = "9",
day = "30",
language = "English",
volume = "253",
pages = "249--257",
journal = "Materials Science & Engineering A: Structural Materials: Properties, Microstructure and Processing",
issn = "0921-5093",
publisher = "Elsevier",
number = "1-2",

}

TY - JOUR

T1 - Non-linear processes in the gas cluster ion beam modification of solid surfaces

AU - Yamada, I.

AU - Matsuo, J.

AU - Toyoda, N.

AU - Aoki, T.

AU - Jones, E.

AU - Insepov, Z.

PY - 1998/9/30

Y1 - 1998/9/30

N2 - The unique characteristics of gas cluster ion beam processing are reviewed. Cluster ion beams consisting of hundreds to thousands of atoms have been generated from various kinds of gas materials. Multiple collisions during the impact of accelerated cluster ions upon the substrate surfaces produce fundamentally non-linear bombarding processes. These bombarding characteristics can be applied to shallow ion implantation, high yield sputtering and smoothing, surface cleaning and low temperature thin film formation.

AB - The unique characteristics of gas cluster ion beam processing are reviewed. Cluster ion beams consisting of hundreds to thousands of atoms have been generated from various kinds of gas materials. Multiple collisions during the impact of accelerated cluster ions upon the substrate surfaces produce fundamentally non-linear bombarding processes. These bombarding characteristics can be applied to shallow ion implantation, high yield sputtering and smoothing, surface cleaning and low temperature thin film formation.

KW - Cluster ion beam

KW - Cluster ion-assisted thin film deposition

KW - Shallow ion implantation

KW - Sputtering

KW - Surface smoothing

UR - http://www.scopus.com/inward/record.url?scp=0001448994&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0001448994&partnerID=8YFLogxK

M3 - Article

VL - 253

SP - 249

EP - 257

JO - Materials Science & Engineering A: Structural Materials: Properties, Microstructure and Processing

JF - Materials Science & Engineering A: Structural Materials: Properties, Microstructure and Processing

SN - 0921-5093

IS - 1-2

ER -