Abstract
Methodologies for the rapid screening of coating systems were developed and applied to photopolymer lacquers for photoembossing applications. Continuous and discrete gradient libraries were prepared with a gradient in grating period along the short axis and along the long axis, a gradient in exposure energy, development temperature, film thickness, photoinitiator concentration, or monomer to polymer mass ratio. Discrete gradient libraries consisted of arrays of rectangular films made by pipetting a certain amount of sample onto a chemically patterned substrate consisting of hydrophilic patches surrounded by hydrophobic, fluorinated barriers. The shape and height of the photoembossed gratings were measured using an automated AFM. Optimum grating height was obtained for a 20-μm period at intermediate exposure energies, photoinitiator concentrations, or both. Height improves with development temperature (max 110 °C), monomer-to-polymer ratio (max 55 wt % monomer), and film thickness. Surface topography can also be optimized, depending on any specific application.
| Original language | English |
|---|---|
| Pages (from-to) | 228-236 |
| Number of pages | 9 |
| Journal | Journal of Combinatorial Chemistry |
| Volume | 8 |
| Issue number | 2 |
| DOIs | |
| Publication status | Published - Mar 2006 |
| Externally published | Yes |
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ASJC Scopus subject areas
- Drug Discovery
- Organic Chemistry
- Chemistry(all)
- Discrete Mathematics and Combinatorics
Cite this
Optimizing photo-embossed gratings : A gradient library approach. / De Gans, Berend Jan; Sánchez, Carlos; Kozodaev, Dimitri; Wouters, Daan; Alexeev, Alexander; Escuti, Michael J.; Bastiaansen, Cees W M; Broer, Dirk J.; Schubert, Ulrich S.
In: Journal of Combinatorial Chemistry, Vol. 8, No. 2, 03.2006, p. 228-236.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Optimizing photo-embossed gratings
T2 - A gradient library approach
AU - De Gans, Berend Jan
AU - Sánchez, Carlos
AU - Kozodaev, Dimitri
AU - Wouters, Daan
AU - Alexeev, Alexander
AU - Escuti, Michael J.
AU - Bastiaansen, Cees W M
AU - Broer, Dirk J.
AU - Schubert, Ulrich S.
PY - 2006/3
Y1 - 2006/3
N2 - Methodologies for the rapid screening of coating systems were developed and applied to photopolymer lacquers for photoembossing applications. Continuous and discrete gradient libraries were prepared with a gradient in grating period along the short axis and along the long axis, a gradient in exposure energy, development temperature, film thickness, photoinitiator concentration, or monomer to polymer mass ratio. Discrete gradient libraries consisted of arrays of rectangular films made by pipetting a certain amount of sample onto a chemically patterned substrate consisting of hydrophilic patches surrounded by hydrophobic, fluorinated barriers. The shape and height of the photoembossed gratings were measured using an automated AFM. Optimum grating height was obtained for a 20-μm period at intermediate exposure energies, photoinitiator concentrations, or both. Height improves with development temperature (max 110 °C), monomer-to-polymer ratio (max 55 wt % monomer), and film thickness. Surface topography can also be optimized, depending on any specific application.
AB - Methodologies for the rapid screening of coating systems were developed and applied to photopolymer lacquers for photoembossing applications. Continuous and discrete gradient libraries were prepared with a gradient in grating period along the short axis and along the long axis, a gradient in exposure energy, development temperature, film thickness, photoinitiator concentration, or monomer to polymer mass ratio. Discrete gradient libraries consisted of arrays of rectangular films made by pipetting a certain amount of sample onto a chemically patterned substrate consisting of hydrophilic patches surrounded by hydrophobic, fluorinated barriers. The shape and height of the photoembossed gratings were measured using an automated AFM. Optimum grating height was obtained for a 20-μm period at intermediate exposure energies, photoinitiator concentrations, or both. Height improves with development temperature (max 110 °C), monomer-to-polymer ratio (max 55 wt % monomer), and film thickness. Surface topography can also be optimized, depending on any specific application.
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UR - http://www.scopus.com/inward/citedby.url?scp=33645522881&partnerID=8YFLogxK
U2 - 10.1021/cc0500506
DO - 10.1021/cc0500506
M3 - Article
VL - 8
SP - 228
EP - 236
JO - ACS Combinatorial Science
JF - ACS Combinatorial Science
SN - 2156-8952
IS - 2
ER -