Optimizing photo-embossed gratings

A gradient library approach

Berend Jan De Gans, Carlos Sánchez, Dimitri Kozodaev, Daan Wouters, Alexander Alexeev, Michael J. Escuti, Cees W M Bastiaansen, Dirk J. Broer, Ulrich S. Schubert

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

Methodologies for the rapid screening of coating systems were developed and applied to photopolymer lacquers for photoembossing applications. Continuous and discrete gradient libraries were prepared with a gradient in grating period along the short axis and along the long axis, a gradient in exposure energy, development temperature, film thickness, photoinitiator concentration, or monomer to polymer mass ratio. Discrete gradient libraries consisted of arrays of rectangular films made by pipetting a certain amount of sample onto a chemically patterned substrate consisting of hydrophilic patches surrounded by hydrophobic, fluorinated barriers. The shape and height of the photoembossed gratings were measured using an automated AFM. Optimum grating height was obtained for a 20-μm period at intermediate exposure energies, photoinitiator concentrations, or both. Height improves with development temperature (max 110 °C), monomer-to-polymer ratio (max 55 wt % monomer), and film thickness. Surface topography can also be optimized, depending on any specific application.

Original languageEnglish
Pages (from-to)228-236
Number of pages9
JournalJournal of Combinatorial Chemistry
Volume8
Issue number2
DOIs
Publication statusPublished - Mar 2006
Externally publishedYes

Fingerprint

Gratings
Libraries
Polymers
Monomers
Lacquer
Gradient
Temperature
Film thickness
Lacquers
Photopolymers
Surface topography
Photopolymer
Surface Topography
Screening
Energy
Coating
Patch
Coatings
Substrate
Substrates

ASJC Scopus subject areas

  • Drug Discovery
  • Organic Chemistry
  • Chemistry(all)
  • Discrete Mathematics and Combinatorics

Cite this

De Gans, B. J., Sánchez, C., Kozodaev, D., Wouters, D., Alexeev, A., Escuti, M. J., ... Schubert, U. S. (2006). Optimizing photo-embossed gratings: A gradient library approach. Journal of Combinatorial Chemistry, 8(2), 228-236. https://doi.org/10.1021/cc0500506

Optimizing photo-embossed gratings : A gradient library approach. / De Gans, Berend Jan; Sánchez, Carlos; Kozodaev, Dimitri; Wouters, Daan; Alexeev, Alexander; Escuti, Michael J.; Bastiaansen, Cees W M; Broer, Dirk J.; Schubert, Ulrich S.

In: Journal of Combinatorial Chemistry, Vol. 8, No. 2, 03.2006, p. 228-236.

Research output: Contribution to journalArticle

De Gans, BJ, Sánchez, C, Kozodaev, D, Wouters, D, Alexeev, A, Escuti, MJ, Bastiaansen, CWM, Broer, DJ & Schubert, US 2006, 'Optimizing photo-embossed gratings: A gradient library approach', Journal of Combinatorial Chemistry, vol. 8, no. 2, pp. 228-236. https://doi.org/10.1021/cc0500506
De Gans, Berend Jan ; Sánchez, Carlos ; Kozodaev, Dimitri ; Wouters, Daan ; Alexeev, Alexander ; Escuti, Michael J. ; Bastiaansen, Cees W M ; Broer, Dirk J. ; Schubert, Ulrich S. / Optimizing photo-embossed gratings : A gradient library approach. In: Journal of Combinatorial Chemistry. 2006 ; Vol. 8, No. 2. pp. 228-236.
@article{596e7ff1cba04ee58d5733d6932df1bd,
title = "Optimizing photo-embossed gratings: A gradient library approach",
abstract = "Methodologies for the rapid screening of coating systems were developed and applied to photopolymer lacquers for photoembossing applications. Continuous and discrete gradient libraries were prepared with a gradient in grating period along the short axis and along the long axis, a gradient in exposure energy, development temperature, film thickness, photoinitiator concentration, or monomer to polymer mass ratio. Discrete gradient libraries consisted of arrays of rectangular films made by pipetting a certain amount of sample onto a chemically patterned substrate consisting of hydrophilic patches surrounded by hydrophobic, fluorinated barriers. The shape and height of the photoembossed gratings were measured using an automated AFM. Optimum grating height was obtained for a 20-μm period at intermediate exposure energies, photoinitiator concentrations, or both. Height improves with development temperature (max 110 °C), monomer-to-polymer ratio (max 55 wt {\%} monomer), and film thickness. Surface topography can also be optimized, depending on any specific application.",
author = "{De Gans}, {Berend Jan} and Carlos S{\'a}nchez and Dimitri Kozodaev and Daan Wouters and Alexander Alexeev and Escuti, {Michael J.} and Bastiaansen, {Cees W M} and Broer, {Dirk J.} and Schubert, {Ulrich S.}",
year = "2006",
month = "3",
doi = "10.1021/cc0500506",
language = "English",
volume = "8",
pages = "228--236",
journal = "ACS Combinatorial Science",
issn = "2156-8952",
publisher = "American Chemical Society",
number = "2",

}

TY - JOUR

T1 - Optimizing photo-embossed gratings

T2 - A gradient library approach

AU - De Gans, Berend Jan

AU - Sánchez, Carlos

AU - Kozodaev, Dimitri

AU - Wouters, Daan

AU - Alexeev, Alexander

AU - Escuti, Michael J.

AU - Bastiaansen, Cees W M

AU - Broer, Dirk J.

AU - Schubert, Ulrich S.

PY - 2006/3

Y1 - 2006/3

N2 - Methodologies for the rapid screening of coating systems were developed and applied to photopolymer lacquers for photoembossing applications. Continuous and discrete gradient libraries were prepared with a gradient in grating period along the short axis and along the long axis, a gradient in exposure energy, development temperature, film thickness, photoinitiator concentration, or monomer to polymer mass ratio. Discrete gradient libraries consisted of arrays of rectangular films made by pipetting a certain amount of sample onto a chemically patterned substrate consisting of hydrophilic patches surrounded by hydrophobic, fluorinated barriers. The shape and height of the photoembossed gratings were measured using an automated AFM. Optimum grating height was obtained for a 20-μm period at intermediate exposure energies, photoinitiator concentrations, or both. Height improves with development temperature (max 110 °C), monomer-to-polymer ratio (max 55 wt % monomer), and film thickness. Surface topography can also be optimized, depending on any specific application.

AB - Methodologies for the rapid screening of coating systems were developed and applied to photopolymer lacquers for photoembossing applications. Continuous and discrete gradient libraries were prepared with a gradient in grating period along the short axis and along the long axis, a gradient in exposure energy, development temperature, film thickness, photoinitiator concentration, or monomer to polymer mass ratio. Discrete gradient libraries consisted of arrays of rectangular films made by pipetting a certain amount of sample onto a chemically patterned substrate consisting of hydrophilic patches surrounded by hydrophobic, fluorinated barriers. The shape and height of the photoembossed gratings were measured using an automated AFM. Optimum grating height was obtained for a 20-μm period at intermediate exposure energies, photoinitiator concentrations, or both. Height improves with development temperature (max 110 °C), monomer-to-polymer ratio (max 55 wt % monomer), and film thickness. Surface topography can also be optimized, depending on any specific application.

UR - http://www.scopus.com/inward/record.url?scp=33645522881&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33645522881&partnerID=8YFLogxK

U2 - 10.1021/cc0500506

DO - 10.1021/cc0500506

M3 - Article

VL - 8

SP - 228

EP - 236

JO - ACS Combinatorial Science

JF - ACS Combinatorial Science

SN - 2156-8952

IS - 2

ER -