Orientation dependent reactive ion etching of GaAs in SiCl4

J. Z. Li, I. Adesida, E. D. Wolf

Research output: Contribution to journalArticle

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Abstract

The reactive ion etching characteristics of (100) GaAs in SiCl4 have been investigated. It was found that pronounced orientation dependent etching could be obtained under plasma conditions of low power density and moderate pressures (around 20 m Torr). At very low pressures, structures with vertical sidewalls were obtained. The structures obtained in the orientation dependent etching mode are similar to those obtained by wet etching and those observed in bromine plasma etching. Etch profiles were different along the [011] and [01̄1] orientations and the relation of etch rates in the different planes follows the relation R〈100〉>R 〈111〉>R〈100〉.

Original languageEnglish
Pages (from-to)897-899
Number of pages3
JournalApplied Physics Letters
Volume45
Issue number8
DOIs
Publication statusPublished - 1984
Externally publishedYes

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etching
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plasma etching
bromine
radiant flux density
low pressure
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ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Orientation dependent reactive ion etching of GaAs in SiCl4 . / Li, J. Z.; Adesida, I.; Wolf, E. D.

In: Applied Physics Letters, Vol. 45, No. 8, 1984, p. 897-899.

Research output: Contribution to journalArticle

Li, J. Z. ; Adesida, I. ; Wolf, E. D. / Orientation dependent reactive ion etching of GaAs in SiCl4 In: Applied Physics Letters. 1984 ; Vol. 45, No. 8. pp. 897-899.
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