Parallel unstructured grid DSMC for the study of molecular gas dynamics in semi-conductor manufacturing

A. Singh, Z. Yong

Research output: Contribution to journalArticle

Abstract

This paper describes the implementation aspects of a two dimensional, unstructured grid based Direct Simulation Monte Carlo (DSMC) flow solver for the study of molecular gas dynamics found in thin film deposition processes. A localized data structure based on domain decomposition is developed to improve the particle/molecule tracking, which is otherwise computationally intensive. The method has been implemented on a massively parallel computing platform for shortened simulation time. Results are validated against known analytical solutions and published results. Furthermore, the influence of parameters, such as sticking coefficient and aspect ratio for step coverage on a 1μm wide trench by sputter deposition was studied. The results show that the step coverage deteriorates with increasing sticking coefficient and aspect ratio.

Original languageEnglish
Pages (from-to)290-301
Number of pages12
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume4228
DOIs
Publication statusPublished - 2000
Externally publishedYes

Fingerprint

Direct Simulation Monte Carlo
Semiconductor Manufacturing
Gas dynamics
Unstructured Grid
gas dynamics
Gas Dynamics
molecular gases
Molecular Dynamics
aspect ratio
Aspect ratio
manufacturing
conductors
Aspect Ratio
Sputter deposition
data structures
Coverage
coefficients
Parallel processing systems
Localized Structures
Data structures

Keywords

  • Direct simulation Monte Carlo
  • Parallel computing
  • Rarefield gas dynamics
  • Thin film
  • Unstructured grid/mesh

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

@article{b9c20931564e468db1d0fc0ec602a119,
title = "Parallel unstructured grid DSMC for the study of molecular gas dynamics in semi-conductor manufacturing",
abstract = "This paper describes the implementation aspects of a two dimensional, unstructured grid based Direct Simulation Monte Carlo (DSMC) flow solver for the study of molecular gas dynamics found in thin film deposition processes. A localized data structure based on domain decomposition is developed to improve the particle/molecule tracking, which is otherwise computationally intensive. The method has been implemented on a massively parallel computing platform for shortened simulation time. Results are validated against known analytical solutions and published results. Furthermore, the influence of parameters, such as sticking coefficient and aspect ratio for step coverage on a 1μm wide trench by sputter deposition was studied. The results show that the step coverage deteriorates with increasing sticking coefficient and aspect ratio.",
keywords = "Direct simulation Monte Carlo, Parallel computing, Rarefield gas dynamics, Thin film, Unstructured grid/mesh",
author = "A. Singh and Z. Yong",
year = "2000",
doi = "10.1117/12.405425",
language = "English",
volume = "4228",
pages = "290--301",
journal = "Proceedings of SPIE - The International Society for Optical Engineering",
issn = "0277-786X",
publisher = "SPIE",

}

TY - JOUR

T1 - Parallel unstructured grid DSMC for the study of molecular gas dynamics in semi-conductor manufacturing

AU - Singh, A.

AU - Yong, Z.

PY - 2000

Y1 - 2000

N2 - This paper describes the implementation aspects of a two dimensional, unstructured grid based Direct Simulation Monte Carlo (DSMC) flow solver for the study of molecular gas dynamics found in thin film deposition processes. A localized data structure based on domain decomposition is developed to improve the particle/molecule tracking, which is otherwise computationally intensive. The method has been implemented on a massively parallel computing platform for shortened simulation time. Results are validated against known analytical solutions and published results. Furthermore, the influence of parameters, such as sticking coefficient and aspect ratio for step coverage on a 1μm wide trench by sputter deposition was studied. The results show that the step coverage deteriorates with increasing sticking coefficient and aspect ratio.

AB - This paper describes the implementation aspects of a two dimensional, unstructured grid based Direct Simulation Monte Carlo (DSMC) flow solver for the study of molecular gas dynamics found in thin film deposition processes. A localized data structure based on domain decomposition is developed to improve the particle/molecule tracking, which is otherwise computationally intensive. The method has been implemented on a massively parallel computing platform for shortened simulation time. Results are validated against known analytical solutions and published results. Furthermore, the influence of parameters, such as sticking coefficient and aspect ratio for step coverage on a 1μm wide trench by sputter deposition was studied. The results show that the step coverage deteriorates with increasing sticking coefficient and aspect ratio.

KW - Direct simulation Monte Carlo

KW - Parallel computing

KW - Rarefield gas dynamics

KW - Thin film

KW - Unstructured grid/mesh

UR - http://www.scopus.com/inward/record.url?scp=0034453860&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0034453860&partnerID=8YFLogxK

U2 - 10.1117/12.405425

DO - 10.1117/12.405425

M3 - Article

VL - 4228

SP - 290

EP - 301

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

SN - 0277-786X

ER -