Abstract
A combinatorial methodology to create and evaluate libraries of photoembossed structures with systematic variations of the period of the structures, and layer thickness was analyzed. The libraries were characterized using automated AFM, providing direct insight into the topography of the surface-relief structures. A temperature gradient stage was employed to generate the temperature-period libraries. It was found that this combinatorial methodology can be easily adapted to other, equally important systems, such as photoresists for microelectronics and photonic applications.
| Original language | English |
|---|---|
| Pages (from-to) | 2567-2571 |
| Number of pages | 5 |
| Journal | Advanced Materials |
| Volume | 17 |
| Issue number | 21 |
| DOIs | |
| Publication status | Published - Nov 4 2005 |
| Externally published | Yes |
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ASJC Scopus subject areas
- Materials Science(all)
Cite this
Photoembossing of periodic relief structures using polymerization-induced diffusion : A combinatorial study. / Sánchez, Carlos; De Gans, Berend Jan; Kozodaev, Dimitri; Alexeev, Alexander; Escuti, Michael J.; Van Heesch, Chris; Bel, Thijs; Schubert, Ulrich S.; Bastiaansen, Cees W M; Broer, Dirk J.
In: Advanced Materials, Vol. 17, No. 21, 04.11.2005, p. 2567-2571.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Photoembossing of periodic relief structures using polymerization-induced diffusion
T2 - A combinatorial study
AU - Sánchez, Carlos
AU - De Gans, Berend Jan
AU - Kozodaev, Dimitri
AU - Alexeev, Alexander
AU - Escuti, Michael J.
AU - Van Heesch, Chris
AU - Bel, Thijs
AU - Schubert, Ulrich S.
AU - Bastiaansen, Cees W M
AU - Broer, Dirk J.
PY - 2005/11/4
Y1 - 2005/11/4
N2 - A combinatorial methodology to create and evaluate libraries of photoembossed structures with systematic variations of the period of the structures, and layer thickness was analyzed. The libraries were characterized using automated AFM, providing direct insight into the topography of the surface-relief structures. A temperature gradient stage was employed to generate the temperature-period libraries. It was found that this combinatorial methodology can be easily adapted to other, equally important systems, such as photoresists for microelectronics and photonic applications.
AB - A combinatorial methodology to create and evaluate libraries of photoembossed structures with systematic variations of the period of the structures, and layer thickness was analyzed. The libraries were characterized using automated AFM, providing direct insight into the topography of the surface-relief structures. A temperature gradient stage was employed to generate the temperature-period libraries. It was found that this combinatorial methodology can be easily adapted to other, equally important systems, such as photoresists for microelectronics and photonic applications.
UR - http://www.scopus.com/inward/record.url?scp=27744573154&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=27744573154&partnerID=8YFLogxK
U2 - 10.1002/adma.200500777
DO - 10.1002/adma.200500777
M3 - Article
VL - 17
SP - 2567
EP - 2571
JO - Advanced Materials
JF - Advanced Materials
SN - 0935-9648
IS - 21
ER -