Photoembossing of periodic relief structures using polymerization-induced diffusion: A combinatorial study

Carlos Sánchez, Berend Jan De Gans, Dimitri Kozodaev, Alexander Alexeev, Michael J. Escuti, Chris Van Heesch, Thijs Bel, Ulrich S. Schubert, Cees W.M. Bastiaansen, Dirk J. Broer

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Abstract

A combinatorial methodology to create and evaluate libraries of photoembossed structures with systematic variations of the period of the structures, and layer thickness was analyzed. The libraries were characterized using automated AFM, providing direct insight into the topography of the surface-relief structures. A temperature gradient stage was employed to generate the temperature-period libraries. It was found that this combinatorial methodology can be easily adapted to other, equally important systems, such as photoresists for microelectronics and photonic applications.

Original languageEnglish
Pages (from-to)2567-2571
Number of pages5
JournalAdvanced Materials
Volume17
Issue number21
DOIs
Publication statusPublished - Nov 4 2005

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ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Sánchez, C., De Gans, B. J., Kozodaev, D., Alexeev, A., Escuti, M. J., Van Heesch, C., Bel, T., Schubert, U. S., Bastiaansen, C. W. M., & Broer, D. J. (2005). Photoembossing of periodic relief structures using polymerization-induced diffusion: A combinatorial study. Advanced Materials, 17(21), 2567-2571. https://doi.org/10.1002/adma.200500777