Photoembossing of periodic relief structures using polymerization-induced diffusion: A combinatorial study

Carlos Sánchez; Berend Jan De Gans; Dimitri Kozodaev; Alexander Alexeev; Michael J. Escuti; Chris Van Heesch; Thijs Bel; Ulrich S. Schubert; Cees W.M. Bastiaansen; Dirk J. Broer

doi:10.1002/adma.200500777

Photoembossing of periodic relief structures using polymerization-induced diffusion: A combinatorial study

Carlos Sánchez, Berend Jan De Gans, Dimitri Kozodaev, Alexander Alexeev, Michael J. Escuti, Chris Van Heesch, Thijs Bel, Ulrich S. Schubert, Cees W.M. Bastiaansen, Dirk J. Broer

Laboratory of Advanced Solar Energy Materials and Systems

Research output: Contribution to journal › Article

41 Citations (Scopus)

Abstract

A combinatorial methodology to create and evaluate libraries of photoembossed structures with systematic variations of the period of the structures, and layer thickness was analyzed. The libraries were characterized using automated AFM, providing direct insight into the topography of the surface-relief structures. A temperature gradient stage was employed to generate the temperature-period libraries. It was found that this combinatorial methodology can be easily adapted to other, equally important systems, such as photoresists for microelectronics and photonic applications.

Original language	English
Pages (from-to)	2567-2571
Number of pages	5
Journal	Advanced Materials
Volume	17
Issue number	21
DOIs	https://doi.org/10.1002/adma.200500777
Publication status	Published - Nov 4 2005

Fingerprint

ASJC Scopus subject areas

Materials Science(all)
Mechanics of Materials
Mechanical Engineering

Cite this

Sánchez, C., De Gans, B. J., Kozodaev, D., Alexeev, A., Escuti, M. J., Van Heesch, C., Bel, T., Schubert, U. S., Bastiaansen, C. W. M., & Broer, D. J. (2005). Photoembossing of periodic relief structures using polymerization-induced diffusion: A combinatorial study. Advanced Materials, 17(21), 2567-2571. https://doi.org/10.1002/adma.200500777

Photoembossing of periodic relief structures using polymerization-induced diffusion : A combinatorial study. / Sánchez, Carlos; De Gans, Berend Jan; Kozodaev, Dimitri; Alexeev, Alexander; Escuti, Michael J.; Van Heesch, Chris; Bel, Thijs; Schubert, Ulrich S.; Bastiaansen, Cees W.M.; Broer, Dirk J.

In: Advanced Materials, Vol. 17, No. 21, 04.11.2005, p. 2567-2571.

Research output: Contribution to journal › Article

Sánchez, Carlos ; De Gans, Berend Jan ; Kozodaev, Dimitri ; Alexeev, Alexander ; Escuti, Michael J. ; Van Heesch, Chris ; Bel, Thijs ; Schubert, Ulrich S. ; Bastiaansen, Cees W.M. ; Broer, Dirk J. / Photoembossing of periodic relief structures using polymerization-induced diffusion : A combinatorial study. In: Advanced Materials. 2005 ; Vol. 17, No. 21. pp. 2567-2571.

@article{98b6cfdcd3414759885e629d0ecee830,

title = "Photoembossing of periodic relief structures using polymerization-induced diffusion: A combinatorial study",

abstract = "A combinatorial methodology to create and evaluate libraries of photoembossed structures with systematic variations of the period of the structures, and layer thickness was analyzed. The libraries were characterized using automated AFM, providing direct insight into the topography of the surface-relief structures. A temperature gradient stage was employed to generate the temperature-period libraries. It was found that this combinatorial methodology can be easily adapted to other, equally important systems, such as photoresists for microelectronics and photonic applications.",

author = "Carlos S{\'a}nchez and {De Gans}, {Berend Jan} and Dimitri Kozodaev and Alexander Alexeev and Escuti, {Michael J.} and {Van Heesch}, Chris and Thijs Bel and Schubert, {Ulrich S.} and Bastiaansen, {Cees W.M.} and Broer, {Dirk J.}",

year = "2005",

month = nov,

day = "4",

doi = "10.1002/adma.200500777",

language = "English",

volume = "17",

pages = "2567--2571",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-VCH Verlag",

number = "21",

}

TY - JOUR

T1 - Photoembossing of periodic relief structures using polymerization-induced diffusion

T2 - A combinatorial study

AU - Sánchez, Carlos

AU - De Gans, Berend Jan

AU - Kozodaev, Dimitri

AU - Alexeev, Alexander

AU - Escuti, Michael J.

AU - Van Heesch, Chris

AU - Bel, Thijs

AU - Schubert, Ulrich S.

AU - Bastiaansen, Cees W.M.

AU - Broer, Dirk J.

PY - 2005/11/4

Y1 - 2005/11/4

N2 - A combinatorial methodology to create and evaluate libraries of photoembossed structures with systematic variations of the period of the structures, and layer thickness was analyzed. The libraries were characterized using automated AFM, providing direct insight into the topography of the surface-relief structures. A temperature gradient stage was employed to generate the temperature-period libraries. It was found that this combinatorial methodology can be easily adapted to other, equally important systems, such as photoresists for microelectronics and photonic applications.

AB - A combinatorial methodology to create and evaluate libraries of photoembossed structures with systematic variations of the period of the structures, and layer thickness was analyzed. The libraries were characterized using automated AFM, providing direct insight into the topography of the surface-relief structures. A temperature gradient stage was employed to generate the temperature-period libraries. It was found that this combinatorial methodology can be easily adapted to other, equally important systems, such as photoresists for microelectronics and photonic applications.

UR - http://www.scopus.com/inward/record.url?scp=27744573154&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=27744573154&partnerID=8YFLogxK

U2 - 10.1002/adma.200500777

DO - 10.1002/adma.200500777

M3 - Article

AN - SCOPUS:27744573154

VL - 17

SP - 2567

EP - 2571

JO - Advanced Materials

JF - Advanced Materials

SN - 0935-9648

IS - 21

ER -

Access to Document

10.1002/adma.200500777