Abstract
A combinatorial methodology to create and evaluate libraries of photoembossed structures with systematic variations of the period of the structures, and layer thickness was analyzed. The libraries were characterized using automated AFM, providing direct insight into the topography of the surface-relief structures. A temperature gradient stage was employed to generate the temperature-period libraries. It was found that this combinatorial methodology can be easily adapted to other, equally important systems, such as photoresists for microelectronics and photonic applications.
Original language | English |
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Pages (from-to) | 2567-2571 |
Number of pages | 5 |
Journal | Advanced Materials |
Volume | 17 |
Issue number | 21 |
DOIs | |
Publication status | Published - Nov 4 2005 |
ASJC Scopus subject areas
- Materials Science(all)
- Mechanics of Materials
- Mechanical Engineering