Processing dependent behavior of soft imprint lithography on the 1-10-nm scale

Feng Hua, Anshu Gaur, Yugang Sun, Michael Word, Niu Jin, Ilesanmi Adesida, Moonsub Shim, Anne Shim, John A. Rogers

Research output: Contribution to journalArticle

55 Citations (Scopus)

Abstract

This paper examines aspects of a soft nanoimprint lithography technique for operation at resolutions that approach the 1-nm regime. Systematic studies using polymer molds made with single walled carbon nanotubes (diameters between 0.5 and 5 nm) and high-resolution electron beam patterned layers of hydrogen silsesquioxane (line widths and heights ∼10 and 20 nm, respectively) as templates reveal a dependence of the resolution limits on the polymer processing conditions. In particular, using a single choice of polymers for the molds and the molded materials, imprint results show that the conditions for spin casting and curing the polymers determine, to a large degree, the resolution and replication fidelity that can be achieved. Optimized procedures enable imprinted polymer surfaces that have a root mean squared surface roughness of ∼ 0.26 nm or lower and a resolution as high as ∼1 nm. These characteristics are significantly better than previous results obtained using these same polymers with unoptimized conditions. A diversity of molded polymers, including Bisphenol-F epoxy resin, polyacrylic acid, and polyurethane, show similar high-fidelity imprinting capabilities. Different procedures enable accurate relief replication for features with modest aspect ratios and dimensions of ∼10 nm. The results indicate that choice of processing conditions is, in addition to materials selections, extremely important in achieving high-fidelity soft nanoimprint lithography in the 1-10-nm regime.

Original languageEnglish
Pages (from-to)301-307
Number of pages7
JournalIEEE Transactions on Nanotechnology
Volume5
Issue number3
DOIs
Publication statusPublished - May 2006
Externally publishedYes

Fingerprint

Lithography
Polymers
Processing
Nanoimprint lithography
Molds
Single-walled carbon nanotubes (SWCN)
Epoxy resins
Linewidth
Polyurethanes
Curing
Aspect ratio
Electron beams
Casting
Surface roughness
Hydrogen
Acids

Keywords

  • Imprint lithography
  • Next generation lithography
  • Poly(dimethylsiloxane) (PDMS)
  • Polymer physics
  • Replica molding

ASJC Scopus subject areas

  • Engineering(all)
  • Hardware and Architecture

Cite this

Processing dependent behavior of soft imprint lithography on the 1-10-nm scale. / Hua, Feng; Gaur, Anshu; Sun, Yugang; Word, Michael; Jin, Niu; Adesida, Ilesanmi; Shim, Moonsub; Shim, Anne; Rogers, John A.

In: IEEE Transactions on Nanotechnology, Vol. 5, No. 3, 05.2006, p. 301-307.

Research output: Contribution to journalArticle

Hua, F, Gaur, A, Sun, Y, Word, M, Jin, N, Adesida, I, Shim, M, Shim, A & Rogers, JA 2006, 'Processing dependent behavior of soft imprint lithography on the 1-10-nm scale', IEEE Transactions on Nanotechnology, vol. 5, no. 3, pp. 301-307. https://doi.org/10.1109/TNANO.2006.874051
Hua, Feng ; Gaur, Anshu ; Sun, Yugang ; Word, Michael ; Jin, Niu ; Adesida, Ilesanmi ; Shim, Moonsub ; Shim, Anne ; Rogers, John A. / Processing dependent behavior of soft imprint lithography on the 1-10-nm scale. In: IEEE Transactions on Nanotechnology. 2006 ; Vol. 5, No. 3. pp. 301-307.
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