Quantum dots fabricated in InP/InGaAs by free Cl2 gas etching and metalorganic chemical vapor deposition regrowth

R. Panepucci, E. Reuter, P. Fay, C. Youtsey, J. Kluender, C. Caneau, J. J. Coleman, S. G. Bishop, I. Adesida

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

The free Cl2 thermal etching of InGaAs/InP was characterized for the fabrication of quantum well dots (QDs) The effects of mask shape on the three-dimensional structure of the dot was investigated Quantum dots with dimensions as small as 56 nm were fabricated using electron beam lithography and free Cl2 etching. The dots were characterized using scanning electron microscopy and low temperature photoluminescence (PL). Metalorganic chemical vapor deposition (MOCVD) regrowth of InP on quantum dots of different mask shapes was investigated. The effect of non-radiative recombination at the etched sidewall was evaluated through the normalized intensity of the PL A red shift of the PL peak with decreasing dot sizes was observed for the as-etched structures and attributed to the effect of residual compressive biaxial strain on the InGaAs layer. Free Cl2 etching is an important etch technique for in situ etch and regrowth processes due to the high quality of the etched interface and the ability to perform selective area regrowth with a SiO2 mask still present.

Original languageEnglish
Pages (from-to)3641-3645
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume14
Issue number6
Publication statusPublished - Nov 1996
Externally publishedYes

Fingerprint

Metallorganic chemical vapor deposition
Semiconductor quantum dots
metalorganic chemical vapor deposition
Masks
Etching
Photoluminescence
masks
quantum dots
etching
photoluminescence
Gases
gases
Electron beam lithography
red shift
Semiconductor quantum wells
lithography
quantum wells
electron beams
Fabrication
Scanning electron microscopy

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Physics and Astronomy (miscellaneous)
  • Surfaces and Interfaces

Cite this

Quantum dots fabricated in InP/InGaAs by free Cl2 gas etching and metalorganic chemical vapor deposition regrowth. / Panepucci, R.; Reuter, E.; Fay, P.; Youtsey, C.; Kluender, J.; Caneau, C.; Coleman, J. J.; Bishop, S. G.; Adesida, I.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 14, No. 6, 11.1996, p. 3641-3645.

Research output: Contribution to journalArticle

Panepucci, R. ; Reuter, E. ; Fay, P. ; Youtsey, C. ; Kluender, J. ; Caneau, C. ; Coleman, J. J. ; Bishop, S. G. ; Adesida, I. / Quantum dots fabricated in InP/InGaAs by free Cl2 gas etching and metalorganic chemical vapor deposition regrowth. In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 1996 ; Vol. 14, No. 6. pp. 3641-3645.
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AU - Youtsey, C.

AU - Kluender, J.

AU - Caneau, C.

AU - Coleman, J. J.

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AU - Adesida, I.

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