Sputter-induced formation of an electron accumulation layer in In 0.52Al0.48As

J. E. Maslar, P. W. Bohn, S. Agarwala, I. Adesida, C. Caneau, R. Bhat

Research output: Contribution to journalArticlepeer-review

5 Citations (Scopus)

Abstract

Ar-sputtering of In0.52Al0.48As was investigated with room-temperature Raman and photoluminescence spectroscopy. A clear increase of carrier density in the near-surface region was observed in the Raman spectra. The PL intensity was found to depend in a complex way on plasma self-bias potential, incident laser irradiance, and InAlAs doping level, indicating that the recombination mechanisms dominating the PL response differ with changing experimental conditions. The observed trends can be explained by sputter-induced formation of an electron accumulation layer in the near-surface region.

Original languageEnglish
Pages (from-to)3575-3577
Number of pages3
JournalApplied Physics Letters
Volume64
Issue number26
DOIs
Publication statusPublished - Dec 1 1994
Externally publishedYes

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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