Abstract
Sputtering is a process of surface erosion by energetic ions. One of the remarkable effects of sputtering with cluster ions is surface smoothing. To understand its mechanism we have developed a computational model, which utilizes molecular dynamics (MD) to simulate rapid atomic collisions in the central impact zone, and a finite-difference method to account for processes occurring on a longer time scale over a wider target area. A case of gas cluster of a few hundred Ar atoms impacting a Cu target with energy up to 20 keV has been considered. The MD simulation has revealed that the atoms ejected from the surface have a significant lateral momentum component (parallel to the surface) which may have a major effect on surface morphology. Evolution of surface morphology under cluster ion irradiation was described by the modified Kuramoto-Sivashinsky equation. Comparison of the simulations with experimental data shows qualitative agreement.
| Original language | English |
|---|---|
| Pages (from-to) | 234-237 |
| Number of pages | 4 |
| Journal | Materials Chemistry and Physics |
| Volume | 54 |
| Issue number | 1-3 |
| DOIs | |
| Publication status | Published - Jul 1998 |
| Externally published | Yes |
Keywords
- Cluster ions
- Impact
- Molecular dynamics
- Surface morphology
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics