Structural and photoluminescent properties of TiN thin films

M. N. Solovan, V. V. Brus, P. D. Maryanchuk, I. M. Fodchuk, V. M. Lorents, A. M. Sletov, M. M. Sletov, M. Gluba

Research output: Contribution to journalArticlepeer-review

7 Citations (Scopus)

Abstract

Structural and photoluminescent properties of TiN thin films deposited by dc reactive magnetron sputtering are studied. It is found that TiN thin films are polycrystalline with a grain size of ∼15 nm and have a NaCl-type cubic crystal structure with a lattice constant of 0.42 nm. The TiN films under study exhibit photoluminescence in the spectral range hν ≈ 2.1–3.4 eV at 300 K.

Original languageEnglish
Pages (from-to)753-755
Number of pages3
JournalOptics and Spectroscopy (English translation of Optika i Spektroskopiya)
Volume117
Issue number5
DOIs
Publication statusPublished - 2014
Externally publishedYes

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics

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