Structural and photoluminescent properties of TiN thin films deposited by dc reactive magnetron sputtering are studied. It is found that TiN thin films are polycrystalline with a grain size of ∼15 nm and have a NaCl-type cubic crystal structure with a lattice constant of 0.42 nm. The TiN films under study exhibit photoluminescence in the spectral range hν ≈ 2.1–3.4 eV at 300 K.
|Number of pages||3|
|Journal||Optics and Spectroscopy (English translation of Optika i Spektroskopiya)|
|Publication status||Published - 2014|
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics