Abstract
Structural and photoluminescent properties of TiN thin films deposited by dc reactive magnetron sputtering are studied. It is found that TiN thin films are polycrystalline with a grain size of ∼15 nm and have a NaCl-type cubic crystal structure with a lattice constant of 0.42 nm. The TiN films under study exhibit photoluminescence in the spectral range hν ≈ 2.1–3.4 eV at 300 K.
Original language | English |
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Pages (from-to) | 753-755 |
Number of pages | 3 |
Journal | Optics and Spectroscopy (English translation of Optika i Spektroskopiya) |
Volume | 117 |
Issue number | 5 |
DOIs | |
Publication status | Published - 2014 |
Externally published | Yes |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Atomic and Molecular Physics, and Optics