@inproceedings{3c3e19be0ba74bc8a9c99939d5475297,
title = "Structural parameters and polarization properties of TiN thin films prepared by reactive magnetron sputtering",
abstract = "We report the results of the investigation of morphological, structural, optical and plarimeteric properties of titanium nitride thin films deposited on silicon and glass substrates. The magnetron sputtered titanium nitride thin films were established to possess crystalline structure with the average grain size about D = 15 nm. The method of correlation matrix is was applied for the analysis of polarization properties of scattered light by the titanium nitride thin film. The obtained experimental result, can be explained by the presence of the effects of linear and circular dichroism in the material of the titanium nitride thin films under investigations.",
keywords = "Polarimetry, Structural properties, Thin film, TiN",
author = "Solovan, {M. M.} and Brus, {V. V.} and Pidkamin, {L. J.} and Maryanchuk, {P. D.} and Dobrovolsky, {Yu G.}",
year = "2015",
doi = "10.1117/12.2228981",
language = "English",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Angelsky, {Oleg V.}",
booktitle = "Twelfth International Conference on Correlation Optics",
address = "United States",
note = "12th International Conference on Correlation Optics ; Conference date: 14-09-2015 Through 18-09-2015",
}