Structural parameters and polarization properties of TiN thin films prepared by reactive magnetron sputtering

M. M. Solovan, V. V. Brus, L. J. Pidkamin, P. D. Maryanchuk, Yu G. Dobrovolsky

Research output: Chapter in Book/Report/Conference proceedingConference contribution

6 Citations (Scopus)

Abstract

We report the results of the investigation of morphological, structural, optical and plarimeteric properties of titanium nitride thin films deposited on silicon and glass substrates. The magnetron sputtered titanium nitride thin films were established to possess crystalline structure with the average grain size about D = 15 nm. The method of correlation matrix is was applied for the analysis of polarization properties of scattered light by the titanium nitride thin film. The obtained experimental result, can be explained by the presence of the effects of linear and circular dichroism in the material of the titanium nitride thin films under investigations.

Original languageEnglish
Title of host publicationTwelfth International Conference on Correlation Optics
EditorsOleg V. Angelsky
PublisherSPIE
ISBN (Electronic)9781510600508
DOIs
Publication statusPublished - 2015
Externally publishedYes
Event12th International Conference on Correlation Optics - Chernivsti, Ukraine
Duration: Sep 14 2015Sep 18 2015

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume9809
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

Conference12th International Conference on Correlation Optics
CountryUkraine
CityChernivsti
Period9/14/159/18/15

Keywords

  • Polarimetry
  • Structural properties
  • Thin film
  • TiN

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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