Study of low-frequency excess noise in RTA annealed n-type gallium nitride

C. F. Zhu, W. K. Fong, B. H. Leung, C. C. Cheng, C. Surya

Research output: Contribution to conferencePaperpeer-review

Abstract

Low-frequency noise is investigated in n-type GaN film grown by rf-plasma assisted molecular beam epitaxy. The temperature dependence of the voltage noise power spectra, SV(f), was examined from 400 K to 80 K in the frequency range between 30 Hz and 100 KHz, which can be modeled as the superposition of 1/f (flicker) noise G-R noise. At f>500 Hz the noise is dominated by G-R noise with activation energies of 360 meV and 65 meV from the conduct band. The results clearly demonstrate the trap origin for both the 1/f noise and G-R noise. At the low-frequency range the fluctuation was dominated by 1/f noise. To determine the origin of the noise we considered both the bulk mobility fluctuation and the trap fluctuation models. Our experimental results showed that rapid thermal annealing (RTA) at 800 °C resulted in over one order of magnitude decrease in the Hooge parameter. Annealing at temperatures in excess of 1000 °C resulted in significant increase in the noise. Photoluminescence and x-ray diffraction measurements also showed that the crystallinity of the films improved with RTA at 800 °C with an accompanying reduction in deep levels. Annealing at 900 °C and 1000 °C resulted in an increase in the FWHM of the x-ray diffraction indicative of thermal decomposition of the materials. The results are in excellent agreement with the trend of Hooge parameters as a function of annealing temperature, strongly indicating trap origin of the observed 1/f noise.

Original languageEnglish
Pages24-29
Number of pages6
Publication statusPublished - Dec 1 2000
Externally publishedYes

ASJC Scopus subject areas

  • Engineering(all)

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