Substrate thickness considerations in electron beam lithography

Ilesanmi Adesida, Thomas E. Everhart

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

A comprehensive theoretical and experimental study of the spatial distribution of electron energy dissipation in a very thin polymer film for dot, line, and parallel line exposures over a wide range of substrate thickness and exposure dosage is reported. The two Monte Carlo models used in the theoretical calculations are reviewed and the theoretical results obtained are discussed. Experimental fabrication of thin substrates and effective techniques of electron beam lithography on such substrates are described. The concept of equienergy dissipation contours is discussed and then used to compare experimental data with theory. Good agreement between experiment and theory has been obtained. With substrate thickness as a variable, the fundamental influence of electron scattering on the resolution of electron beam lithography has been verified.

Original languageEnglish
Pages (from-to)5994-6005
Number of pages12
JournalJournal of Applied Physics
Volume51
Issue number11
DOIs
Publication statusPublished - 1980
Externally publishedYes

Fingerprint

lithography
electron beams
spatial distribution
electron scattering
dissipation
energy dissipation
electron energy
dosage
fabrication
polymers

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

Substrate thickness considerations in electron beam lithography. / Adesida, Ilesanmi; Everhart, Thomas E.

In: Journal of Applied Physics, Vol. 51, No. 11, 1980, p. 5994-6005.

Research output: Contribution to journalArticle

Adesida, Ilesanmi ; Everhart, Thomas E. / Substrate thickness considerations in electron beam lithography. In: Journal of Applied Physics. 1980 ; Vol. 51, No. 11. pp. 5994-6005.
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