Surface modifications by gas cluster ion beams

I. Yamada, J. Matsuo, Z. Insepov, M. Akizuki

Research output: Contribution to journalArticle

43 Citations (Scopus)

Abstract

New aspects of surface treatment by gas cluster ion beams are discussed. Molecular dynamics simulation has shown that a considerably high damage region is formed at a depth exceeding the mean projected range of the implanted atoms. High yield sputtering has also been shown to occur with respect to lateral sputtering. Experiments on shallow implantation, high yield sputtering, surface smoothing and low damage surface cleaning were performed. The obtained results are compared with those of conventional monomer ion irradiation. Possible applications of ionized cluster beams to a new area of surface modifications are discussed.

Original languageEnglish
Pages (from-to)165-169
Number of pages5
JournalNuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volume106
Issue number1-4
DOIs
Publication statusPublished - Dec 2 1995
Externally publishedYes

Fingerprint

Ion beams
Sputtering
Surface treatment
sputtering
ion beams
Gases
gases
damage
Surface cleaning
Ion bombardment
surface treatment
ion irradiation
smoothing
cleaning
Molecular dynamics
implantation
monomers
Monomers
molecular dynamics
Atoms

ASJC Scopus subject areas

  • Instrumentation
  • Nuclear and High Energy Physics

Cite this

Surface modifications by gas cluster ion beams. / Yamada, I.; Matsuo, J.; Insepov, Z.; Akizuki, M.

In: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, Vol. 106, No. 1-4, 02.12.1995, p. 165-169.

Research output: Contribution to journalArticle

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