Abstract
Gas cluster ion beam techniques have been developed for atomic and molecular level surface modification processing. Shallow implantation, high yield sputtering, surface smoothing, and low damage surface cleaning have been demonstrated experimentally. This article reports recent results concerning surface treatments that are distinctly different from those produced by conventional monomer ion irradiation. Possible applications of gas cluster ion beam processing to new areas of surface modifications are suggested.
| Original language | English |
|---|---|
| Pages (from-to) | 781-785 |
| Number of pages | 5 |
| Journal | Journal of Vacuum Science and Technology A |
| Volume | 14 |
| Issue number | 3 |
| Publication status | Published - May 1996 |
| Externally published | Yes |
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ASJC Scopus subject areas
- Surfaces, Coatings and Films
- Physics and Astronomy (miscellaneous)
- Surfaces and Interfaces
Cite this
Surface processing by gas cluster ion beams at the atomic (molecular) level. / Yamada, I.; Matsuo, J.; Insepov, Z.; Takeuchi, D.; Akizuki, M.; Toyoda, N.
In: Journal of Vacuum Science and Technology A, Vol. 14, No. 3, 05.1996, p. 781-785.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Surface processing by gas cluster ion beams at the atomic (molecular) level
AU - Yamada, I.
AU - Matsuo, J.
AU - Insepov, Z.
AU - Takeuchi, D.
AU - Akizuki, M.
AU - Toyoda, N.
PY - 1996/5
Y1 - 1996/5
N2 - Gas cluster ion beam techniques have been developed for atomic and molecular level surface modification processing. Shallow implantation, high yield sputtering, surface smoothing, and low damage surface cleaning have been demonstrated experimentally. This article reports recent results concerning surface treatments that are distinctly different from those produced by conventional monomer ion irradiation. Possible applications of gas cluster ion beam processing to new areas of surface modifications are suggested.
AB - Gas cluster ion beam techniques have been developed for atomic and molecular level surface modification processing. Shallow implantation, high yield sputtering, surface smoothing, and low damage surface cleaning have been demonstrated experimentally. This article reports recent results concerning surface treatments that are distinctly different from those produced by conventional monomer ion irradiation. Possible applications of gas cluster ion beam processing to new areas of surface modifications are suggested.
UR - http://www.scopus.com/inward/record.url?scp=5844321304&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=5844321304&partnerID=8YFLogxK
M3 - Article
VL - 14
SP - 781
EP - 785
JO - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
JF - Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SN - 0734-2101
IS - 3
ER -