Surface processing by gas cluster ion beams at the atomic (molecular) level

I. Yamada, J. Matsuo, Z. Insepov, D. Takeuchi, M. Akizuki, N. Toyoda

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Abstract

Gas cluster ion beam techniques have been developed for atomic and molecular level surface modification processing. Shallow implantation, high yield sputtering, surface smoothing, and low damage surface cleaning have been demonstrated experimentally. This article reports recent results concerning surface treatments that are distinctly different from those produced by conventional monomer ion irradiation. Possible applications of gas cluster ion beam processing to new areas of surface modifications are suggested.

Original languageEnglish
Pages (from-to)781-785
Number of pages5
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume14
Issue number3
DOIs
Publication statusPublished - Jan 1 1996

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ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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