Surface processing by gas cluster ion beams at the atomic (molecular) level

I. Yamada, J. Matsuo, Z. Insepov, D. Takeuchi, M. Akizuki, N. Toyoda

Research output: Contribution to journalArticle

61 Citations (Scopus)

Abstract

Gas cluster ion beam techniques have been developed for atomic and molecular level surface modification processing. Shallow implantation, high yield sputtering, surface smoothing, and low damage surface cleaning have been demonstrated experimentally. This article reports recent results concerning surface treatments that are distinctly different from those produced by conventional monomer ion irradiation. Possible applications of gas cluster ion beam processing to new areas of surface modifications are suggested.

Original languageEnglish
Pages (from-to)781-785
Number of pages5
JournalJournal of Vacuum Science and Technology A
Volume14
Issue number3
Publication statusPublished - May 1996
Externally publishedYes

Fingerprint

Ion beams
Surface treatment
Gases
ion beams
Processing
gases
Surface cleaning
Ion bombardment
Sputtering
Monomers
surface treatment
ion irradiation
smoothing
cleaning
implantation
monomers
sputtering
damage

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Physics and Astronomy (miscellaneous)
  • Surfaces and Interfaces

Cite this

Yamada, I., Matsuo, J., Insepov, Z., Takeuchi, D., Akizuki, M., & Toyoda, N. (1996). Surface processing by gas cluster ion beams at the atomic (molecular) level. Journal of Vacuum Science and Technology A, 14(3), 781-785.

Surface processing by gas cluster ion beams at the atomic (molecular) level. / Yamada, I.; Matsuo, J.; Insepov, Z.; Takeuchi, D.; Akizuki, M.; Toyoda, N.

In: Journal of Vacuum Science and Technology A, Vol. 14, No. 3, 05.1996, p. 781-785.

Research output: Contribution to journalArticle

Yamada, I, Matsuo, J, Insepov, Z, Takeuchi, D, Akizuki, M & Toyoda, N 1996, 'Surface processing by gas cluster ion beams at the atomic (molecular) level', Journal of Vacuum Science and Technology A, vol. 14, no. 3, pp. 781-785.
Yamada, I. ; Matsuo, J. ; Insepov, Z. ; Takeuchi, D. ; Akizuki, M. ; Toyoda, N. / Surface processing by gas cluster ion beams at the atomic (molecular) level. In: Journal of Vacuum Science and Technology A. 1996 ; Vol. 14, No. 3. pp. 781-785.
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