Poly(methylmethacrylate) (PMMA) with various molecular weights exposed using 50 keV electron beam have been investigated at subzero developer temperatures. Contrast curves for Methyl Isobutyl Ketone (MIBK):Isopropyl Alcohol (IPA)=1:3 and MIBK: IPA=1:7 developers were determined. The contrast curves for different molecular weight PMMA resists converge into a single curve at lower temperatures. At low temperatures, the line edge roughness and resolution improved. However, minimum line pitch shows no significant improvement while dose latitudes for a particular line pitch increased. It is shown that at low temperatures, linewidth resolution and periodicity are invariant for the different PMMA molecular weights (50 K to 2.2M) used in this work.
|Number of pages||5|
|Journal||Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures|
|Publication status||Published - Dec 11 2008|
ASJC Scopus subject areas
- Condensed Matter Physics
- Electrical and Electronic Engineering