The effects of molecular weight on the exposure characteristics of poly(methylmethacrylate) developed at low temperatures

M. Yan, S. Choi, K. R V Subramanian, I. Adesida

Research output: Contribution to journalArticle

31 Citations (Scopus)

Abstract

Poly(methylmethacrylate) (PMMA) with various molecular weights exposed using 50 keV electron beam have been investigated at subzero developer temperatures. Contrast curves for Methyl Isobutyl Ketone (MIBK):Isopropyl Alcohol (IPA)=1:3 and MIBK: IPA=1:7 developers were determined. The contrast curves for different molecular weight PMMA resists converge into a single curve at lower temperatures. At low temperatures, the line edge roughness and resolution improved. However, minimum line pitch shows no significant improvement while dose latitudes for a particular line pitch increased. It is shown that at low temperatures, linewidth resolution and periodicity are invariant for the different PMMA molecular weights (50 K to 2.2M) used in this work.

Original languageEnglish
Pages (from-to)2306-2310
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume26
Issue number6
DOIs
Publication statusPublished - 2008
Externally publishedYes

Fingerprint

isopropyl alcohol
molecular weight
Molecular weight
photographic developers
ketones
curves
Ketones
Alcohols
Temperature
periodic variations
roughness
Linewidth
electron beams
Electron beams
dosage
Surface roughness
temperature

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this

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abstract = "Poly(methylmethacrylate) (PMMA) with various molecular weights exposed using 50 keV electron beam have been investigated at subzero developer temperatures. Contrast curves for Methyl Isobutyl Ketone (MIBK):Isopropyl Alcohol (IPA)=1:3 and MIBK: IPA=1:7 developers were determined. The contrast curves for different molecular weight PMMA resists converge into a single curve at lower temperatures. At low temperatures, the line edge roughness and resolution improved. However, minimum line pitch shows no significant improvement while dose latitudes for a particular line pitch increased. It is shown that at low temperatures, linewidth resolution and periodicity are invariant for the different PMMA molecular weights (50 K to 2.2M) used in this work.",
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T1 - The effects of molecular weight on the exposure characteristics of poly(methylmethacrylate) developed at low temperatures

AU - Yan, M.

AU - Choi, S.

AU - Subramanian, K. R V

AU - Adesida, I.

PY - 2008

Y1 - 2008

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AB - Poly(methylmethacrylate) (PMMA) with various molecular weights exposed using 50 keV electron beam have been investigated at subzero developer temperatures. Contrast curves for Methyl Isobutyl Ketone (MIBK):Isopropyl Alcohol (IPA)=1:3 and MIBK: IPA=1:7 developers were determined. The contrast curves for different molecular weight PMMA resists converge into a single curve at lower temperatures. At low temperatures, the line edge roughness and resolution improved. However, minimum line pitch shows no significant improvement while dose latitudes for a particular line pitch increased. It is shown that at low temperatures, linewidth resolution and periodicity are invariant for the different PMMA molecular weights (50 K to 2.2M) used in this work.

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