The effects of molecular weight on the exposure characteristics of poly(methylmethacrylate) developed at low temperatures

M. Yan, S. Choi, K. R.V. Subramanian, I. Adesida

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Poly(methylmethacrylate) (PMMA) with various molecular weights exposed using 50 keV electron beam have been investigated at subzero developer temperatures. Contrast curves for Methyl Isobutyl Ketone (MIBK):Isopropyl Alcohol (IPA)=1:3 and MIBK: IPA=1:7 developers were determined. The contrast curves for different molecular weight PMMA resists converge into a single curve at lower temperatures. At low temperatures, the line edge roughness and resolution improved. However, minimum line pitch shows no significant improvement while dose latitudes for a particular line pitch increased. It is shown that at low temperatures, linewidth resolution and periodicity are invariant for the different PMMA molecular weights (50 K to 2.2M) used in this work.

Original languageEnglish
Pages (from-to)2306-2310
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Issue number6
Publication statusPublished - Dec 11 2008


ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

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