Abstract
Uniform Ti-doped hematite thin films were deposited on transparent fluorine-doped tin oxide FTO coated glasses using a pulsed laser deposition method. An influence of dopant concentration on the photoelectrochemical characteristics was examined under water splitting. Photocurrent measurements indicated that 3 mol% of Ti atoms was optimal dopant concentration in hematite films produced by this method. The maximum photocurrent density of un-doped and 3 mol% Ti-doped Fe2O3 photoelectrodes was 0.67 and 1.64 mA/cm2 at 1.23 V versus RHE, respectively. The incorporation of Ti atoms into hematite photoelectrodes was found to drastically enhance the water splitting performance.
| Original language | English |
|---|---|
| Pages (from-to) | 1539-1542 |
| Number of pages | 4 |
| Journal | Applied Physics A: Materials Science and Processing |
| Volume | 118 |
| Issue number | 4 |
| DOIs | |
| Publication status | Published - 2014 |
| Externally published | Yes |
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ASJC Scopus subject areas
- Materials Science(all)
- Chemistry(all)
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Ti-doped hematite thin films for efficient water splitting. / Atabaev, Timur Sh; Ajmal, Muhammad; Hong, Nguyen Hoa; Kim, Hyung Kook; Hwang, Yoon Hwae.
In: Applied Physics A: Materials Science and Processing, Vol. 118, No. 4, 2014, p. 1539-1542.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Ti-doped hematite thin films for efficient water splitting
AU - Atabaev, Timur Sh
AU - Ajmal, Muhammad
AU - Hong, Nguyen Hoa
AU - Kim, Hyung Kook
AU - Hwang, Yoon Hwae
PY - 2014
Y1 - 2014
N2 - Uniform Ti-doped hematite thin films were deposited on transparent fluorine-doped tin oxide FTO coated glasses using a pulsed laser deposition method. An influence of dopant concentration on the photoelectrochemical characteristics was examined under water splitting. Photocurrent measurements indicated that 3 mol% of Ti atoms was optimal dopant concentration in hematite films produced by this method. The maximum photocurrent density of un-doped and 3 mol% Ti-doped Fe2O3 photoelectrodes was 0.67 and 1.64 mA/cm2 at 1.23 V versus RHE, respectively. The incorporation of Ti atoms into hematite photoelectrodes was found to drastically enhance the water splitting performance.
AB - Uniform Ti-doped hematite thin films were deposited on transparent fluorine-doped tin oxide FTO coated glasses using a pulsed laser deposition method. An influence of dopant concentration on the photoelectrochemical characteristics was examined under water splitting. Photocurrent measurements indicated that 3 mol% of Ti atoms was optimal dopant concentration in hematite films produced by this method. The maximum photocurrent density of un-doped and 3 mol% Ti-doped Fe2O3 photoelectrodes was 0.67 and 1.64 mA/cm2 at 1.23 V versus RHE, respectively. The incorporation of Ti atoms into hematite photoelectrodes was found to drastically enhance the water splitting performance.
UR - http://www.scopus.com/inward/record.url?scp=84925538976&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84925538976&partnerID=8YFLogxK
U2 - 10.1007/s00339-014-8937-7
DO - 10.1007/s00339-014-8937-7
M3 - Article
VL - 118
SP - 1539
EP - 1542
JO - Applied Physics
JF - Applied Physics
SN - 0340-3793
IS - 4
ER -