Ti-doped hematite thin films for efficient water splitting

Timur Sh Atabaev, Muhammad Ajmal, Nguyen Hoa Hong, Hyung Kook Kim, Yoon Hwae Hwang

Research output: Contribution to journalArticle

17 Citations (Scopus)

Abstract

Uniform Ti-doped hematite thin films were deposited on transparent fluorine-doped tin oxide FTO coated glasses using a pulsed laser deposition method. An influence of dopant concentration on the photoelectrochemical characteristics was examined under water splitting. Photocurrent measurements indicated that 3 mol% of Ti atoms was optimal dopant concentration in hematite films produced by this method. The maximum photocurrent density of un-doped and 3 mol% Ti-doped Fe2O3 photoelectrodes was 0.67 and 1.64 mA/cm2 at 1.23 V versus RHE, respectively. The incorporation of Ti atoms into hematite photoelectrodes was found to drastically enhance the water splitting performance.

Original languageEnglish
Pages (from-to)1539-1542
Number of pages4
JournalApplied Physics A: Materials Science and Processing
Volume118
Issue number4
DOIs
Publication statusPublished - 2014
Externally publishedYes

ASJC Scopus subject areas

  • Materials Science(all)
  • Chemistry(all)

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