Ti-doped hematite thin films for efficient water splitting

Timur Sh Atabaev, Muhammad Ajmal, Nguyen Hoa Hong, Hyung Kook Kim, Yoon Hwae Hwang

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

Uniform Ti-doped hematite thin films were deposited on transparent fluorine-doped tin oxide FTO coated glasses using a pulsed laser deposition method. An influence of dopant concentration on the photoelectrochemical characteristics was examined under water splitting. Photocurrent measurements indicated that 3 mol% of Ti atoms was optimal dopant concentration in hematite films produced by this method. The maximum photocurrent density of un-doped and 3 mol% Ti-doped Fe2O3 photoelectrodes was 0.67 and 1.64 mA/cm2 at 1.23 V versus RHE, respectively. The incorporation of Ti atoms into hematite photoelectrodes was found to drastically enhance the water splitting performance.

Original languageEnglish
Pages (from-to)1539-1542
Number of pages4
JournalApplied Physics A: Materials Science and Processing
Volume118
Issue number4
DOIs
Publication statusPublished - 2014
Externally publishedYes

Fingerprint

Hematite
Photocurrents
Thin films
Water
Doping (additives)
Atoms
Fluorine
Pulsed laser deposition
Tin oxides
Glass
ferric oxide

ASJC Scopus subject areas

  • Materials Science(all)
  • Chemistry(all)

Cite this

Ti-doped hematite thin films for efficient water splitting. / Atabaev, Timur Sh; Ajmal, Muhammad; Hong, Nguyen Hoa; Kim, Hyung Kook; Hwang, Yoon Hwae.

In: Applied Physics A: Materials Science and Processing, Vol. 118, No. 4, 2014, p. 1539-1542.

Research output: Contribution to journalArticle

Atabaev, Timur Sh ; Ajmal, Muhammad ; Hong, Nguyen Hoa ; Kim, Hyung Kook ; Hwang, Yoon Hwae. / Ti-doped hematite thin films for efficient water splitting. In: Applied Physics A: Materials Science and Processing. 2014 ; Vol. 118, No. 4. pp. 1539-1542.
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