Ti-doped hematite thin films for efficient water splitting

Timur Sh Atabaev; Muhammad Ajmal; Nguyen Hoa Hong; Hyung Kook Kim; Yoon Hwae Hwang

doi:10.1007/s00339-014-8937-7

Ti-doped hematite thin films for efficient water splitting

Timur Sh Atabaev, Muhammad Ajmal, Nguyen Hoa Hong, Hyung Kook Kim, Yoon Hwae Hwang

Research output: Contribution to journal › Article › peer-review

21 Citations (Scopus)

Abstract

Uniform Ti-doped hematite thin films were deposited on transparent fluorine-doped tin oxide FTO coated glasses using a pulsed laser deposition method. An influence of dopant concentration on the photoelectrochemical characteristics was examined under water splitting. Photocurrent measurements indicated that 3 mol% of Ti atoms was optimal dopant concentration in hematite films produced by this method. The maximum photocurrent density of un-doped and 3 mol% Ti-doped Fe₂O₃ photoelectrodes was 0.67 and 1.64 mA/cm² at 1.23 V versus RHE, respectively. The incorporation of Ti atoms into hematite photoelectrodes was found to drastically enhance the water splitting performance.

Original language	English
Pages (from-to)	1539-1542
Number of pages	4
Journal	Applied Physics A: Materials Science and Processing
Volume	118
Issue number	4
DOIs	https://doi.org/10.1007/s00339-014-8937-7
Publication status	Published - 2014
Externally published	Yes

ASJC Scopus subject areas

Materials Science(all)
Chemistry(all)

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title = "Ti-doped hematite thin films for efficient water splitting",

abstract = "Uniform Ti-doped hematite thin films were deposited on transparent fluorine-doped tin oxide FTO coated glasses using a pulsed laser deposition method. An influence of dopant concentration on the photoelectrochemical characteristics was examined under water splitting. Photocurrent measurements indicated that 3 mol% of Ti atoms was optimal dopant concentration in hematite films produced by this method. The maximum photocurrent density of un-doped and 3 mol% Ti-doped Fe2O3 photoelectrodes was 0.67 and 1.64 mA/cm2 at 1.23 V versus RHE, respectively. The incorporation of Ti atoms into hematite photoelectrodes was found to drastically enhance the water splitting performance.",

author = "Atabaev, {Timur Sh} and Muhammad Ajmal and Hong, {Nguyen Hoa} and Kim, {Hyung Kook} and Hwang, {Yoon Hwae}",

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T1 - Ti-doped hematite thin films for efficient water splitting

AU - Atabaev, Timur Sh

AU - Ajmal, Muhammad

AU - Hong, Nguyen Hoa

AU - Kim, Hyung Kook

AU - Hwang, Yoon Hwae

PY - 2014

Y1 - 2014

N2 - Uniform Ti-doped hematite thin films were deposited on transparent fluorine-doped tin oxide FTO coated glasses using a pulsed laser deposition method. An influence of dopant concentration on the photoelectrochemical characteristics was examined under water splitting. Photocurrent measurements indicated that 3 mol% of Ti atoms was optimal dopant concentration in hematite films produced by this method. The maximum photocurrent density of un-doped and 3 mol% Ti-doped Fe2O3 photoelectrodes was 0.67 and 1.64 mA/cm2 at 1.23 V versus RHE, respectively. The incorporation of Ti atoms into hematite photoelectrodes was found to drastically enhance the water splitting performance.

AB - Uniform Ti-doped hematite thin films were deposited on transparent fluorine-doped tin oxide FTO coated glasses using a pulsed laser deposition method. An influence of dopant concentration on the photoelectrochemical characteristics was examined under water splitting. Photocurrent measurements indicated that 3 mol% of Ti atoms was optimal dopant concentration in hematite films produced by this method. The maximum photocurrent density of un-doped and 3 mol% Ti-doped Fe2O3 photoelectrodes was 0.67 and 1.64 mA/cm2 at 1.23 V versus RHE, respectively. The incorporation of Ti atoms into hematite photoelectrodes was found to drastically enhance the water splitting performance.

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Ti-doped hematite thin films for efficient water splitting

Abstract

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